Harmless Disposal System of NF3 in the Manufacturing Process of Semiconductor Using Chemical Reaction

半导体制造过程中NF3化学反应无害化处理系统

• 批准号: 11650788
• 负责人: YAMAMOTO Hideki
• 金额: $ 1.73万
• 依托单位: Kansai University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650788/
• 关键词: environmental protection; global warming gases; harmless disposal; semiconductor; etching gas; fluoride gas; nitrogen fluoride; metal chloride; 特殊ガス; 無害化; 半導体製造; 三フッ化窒素; 塩化カルシウム; 化学反応; フッ化カルシウム; 温室効果

The chemical reactions of fluoride gases with metal chloride or metal oxide are utilized as an effective treatment for harmless disposal. These chemical reactions can be adopted in the temperature range of 80℃〜400℃, which is lower than that in the combustion treatment (800℃). Reaction products are metal fluoride or metal chloride which are a harmless and a valuable chemical material as one of new resources. This paper concerns with a new harmless disposal treatment of toxic global warming gases.

氟化物气体与金属氯化物或金属氧化物的化学反应被用作无害化处置的有效处理方法。这些化学反应可以在80℃~ 400℃的温度范围内进行，比燃烧处理（800℃）的温度要低。反应产物为金属氟化物或金属氯化物，是一种无害的、有价值的化工原料，是新资源之一。本文讨论了一种新的无害化处理全球变暖有毒气体的方法。

项目成果

J.Shibata and H.Yamamoto: "Harmless Disposal of Special Material Gases."Chemical Engineering. Vol.45. 35-41 (2000)

J.Shibata 和 H.Yamamoto：“特殊材料气体的无害处理”。化学工程。

Hideki Yamamoto and Junji Shibata: "Disposal of Waste Fluoride and Chloride Gases in the Manufacturing Process of Semiconductors"Proceedings of Second International Conference on Material Processing for Pronerties (PMP2000). Vol.1. 685-688 (2000)

Hideki Yamamoto 和 Junji Shibata：“半导体制造过程中废弃氟化物和氯化物气体的处理”第二届国际材料加工会议论文集 (PMP2000)。

J.Shibata and H.Yamamoto: "Harmless Disposal Technology for Special Material Gases using Semiconductor Manufacturing Process"Eco-Industry. Vol.3. 26-33 (2000)

J.Shibata和H.Yamamoto：“利用半导体制造工艺的特殊材料气体无害化处理技术”生态产业。

芝田隼次,山本秀樹: "特殊材料ガスの無害化処理"ケミカルエンジニアリング. 45巻. 35-41 (2000)

Junji Shibata，Hideki Yamamoto：“特殊材料气体的无毒处理”化学工程卷 45. 35-41 (2000)。

Hideki Yamamoto and Junji Shibata: "Disposal of Waste Fluoride and Chloride Gases in the Manufacturing Process of Semiconductors"Proceedings of Second International Conference on Material Processing for Properties (PMP2000). Vol.1. 685-688 (2000)

Hideki Yamamoto 和 Junji Shibata：“半导体制造过程中废弃氟化物和氯化物气体的处理”第二届国际材料加工性能会议 (PMP2000) 论文集。