Photosensitivity Mechanism of Chemically Modified Gel Films and Their Application to the Fabrication of Micro-Devices
Photosensitivity Mechanism of Chemically Modified Gel Films and Their Application to the Fabrication of Micro-Devices
批准号:
11650866
负责人:
TOHGE Noboru
金额:
$2.3万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
本课题旨在研究化学修饰凝胶膜的光敏机理,并将其应用于微器件的制作。1)建立了光学和电子器件的基本材料Nb_2O_5、ZrO_2-SiO_2、PZT和PLZT等多种光敏凝胶薄膜的制备和图案化条件,并对所得到的氧化膜进行了表征。2)用邻菲咯啉对硅烷氧化物进行化学修饰或使用带有甲基丙烯酰基的三官能团醇盐来制备光敏SiO_2凝胶薄膜。3)研究了用光敏ZrO_2制备布拉格衍射光栅的制备工艺。用位相掩模和双光束干涉方法制备了PZT和PLZT凝胶薄膜,并对所得到的凝胶薄膜进行了表征。4)凝胶薄膜在两束干涉条纹的双重曝光下,得到了晶格和岛型的二维光栅,这取决于激光的照射能量。5)用β-二酮和甲基丙烯酸同时化学修饰钛醇盐,提高了凝胶薄膜的光敏性和分辨率。6)对不同β-二酮化学修饰的金属醇盐的电子态进行了分子轨道计算,给出了光学吸收光谱。提出了一种在SnO_2涂层玻璃衬底上沉积图案化的TiO_2薄膜的双层光催化剂,这种新型光催化剂对甲醇制氢以及有害有机化合物的分解都具有很高的活性。
英文摘要
The current research project has been carried out to study the mechanism of photosensitivity of chemically modified gel films and apply them to the fabrication of microdevices. The following results have been obtained.1) Preparation and patterning conditions of a variety of photosensitive gel films such as Nb_2O_5, ZrO_2-SiO_2, PZT and PLZT, which are essential materials for optical and electronic devices, have been established and the resultant oxide films have been characterized.2) Chemical modification of Si-alkoxides with phenanthroline or the use of tri-functional alkoxides with a methacryl group has been found to give photosensitive SiO_2 gel films.3) The preparation process has been examined to fabricate Bragg diffraction gratings using photosensitive ZrO_2, PZT and PLZT gel films by the phase mask and two-beam-interference methods and the gratings obtained have been characterized in terms of preparation conditions.4) Double exposure of gel films to two-beam-interference fringes gave two-dimensional gratings of lattice and island types depending on the irradiation energy of laser.5) Simultaneous chemical modification of Ti-alkoxide with β-diketone and methacrylic acid brought about an increase in both photosensitivity and resolution of the resultant gel films.6) Molecular orbital calculation of electronic state of metal-alkoxides chemically modified with various β-diketones gave optical absorption spectra, which were in good agreement with the experimental ones.7) Double layer type of photocatalyst where patterned TiO_2 film is deposited on a SnO_2-coated glass substrate has been proposed and this new type of photocatalyst has been shown to be highly active for the acquisition of hydrogen from methanol, as well as the decomposition of harmful organic compounds.
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H.Tada,A.Hattori,Y.Tokihisa,K.Imai,N.Tohge and S.Ito: "A Patterned-TiO_2/SnO_2 Bilayer Type Photocatalyst"J.Phys.Chem.B. 104. 4585-4587 (2000)
H.Tada,A.Hattori,Y.Tokihisa,K.Imai,N.Tohge 和 S.Ito:“一种图案化的 TiO_2/SnO_2 双层型光催化剂”J.Phys.Chem.B。
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通讯作者:
N.Tohge and Y.Takama: "Direct Fine-Patterning of PZT Thin Films Using Photosensitive Gel Films Derived from Chemically Modified Metal-Alkoxides"J.Mater.Sci. : Mater.Electron.. 10. 273-277 (1999)
N.Tohge 和 Y.Takama:“使用化学改性金属醇盐衍生的光敏凝胶膜直接对 PZT 薄膜进行精细图案化”J.Mater.Sci。
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峠登(分担執筆): "ゾル-ゲル法による材料開発と応用展開"シーエムシー. 216 (2000)
Noboru Toge(撰稿人):“使用溶胶-凝胶法的材料开发和应用开发”CMC 216(2000)。
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N.Tohge,G.Zhao and F.Chiba: "Photosensitive Gel Films Prepared by the Chemical Modification and Their Application to Surface-Relief Gratings"Thin Solid Films. 351. 85-90 (1999)
N.Tohge、G.Zhao 和 F.Chiba:“化学改性制备的光敏凝胶薄膜及其在表面浮雕光栅中的应用”固体薄膜。
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通讯作者:
N.Tohge,K.Yamada and N.Noma: "Selective Coloration of Photosensitive ZrO_2 Gel Films"J.Ceram.Soc.Jpn. 109(印刷中). (2001)
N. Tohge、K. Yamada 和 N. Noma:“光敏 ZrO_2 凝胶薄膜的选择性着色”J. Ceram Jpn。
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共 6 条
Fabricatio of Photonic Devices Using Photosensitive Gel Films and Their Properties
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批准号:12555179
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$3.58万
-
财政年份:2000
-
负责人:TOHGE Noboru
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依托单位:
Preparation of Functional Thin Films and Fine-Patterning by the Photo-Assisted Process
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批准号:09650930
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.18万
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财政年份:1997
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负责人:TOHGE Noboru
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依托单位:
Preparation and Characterization of Ferroelectric Thin Films for Memories by the Chemical Process
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批准号:04555188
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$4.48万
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财政年份:1992
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负责人:TOHGE Noboru
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依托单位:
Preparation of Ferroelectric Films by the Sol-Gel Method
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批准号:62550570
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.22万
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财政年份:1987
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负责人:TOHGE Noboru
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依托单位:
海外基金