Preparation of Functional Thin Films and Fine-Patterning by the Photo-Assisted Process

光辅助工艺制备功能薄膜和精细图案

• 批准号: 09650930
• 负责人: TOHGE Noboru
• 金额: $ 2.18万
• 依托单位: Kinki University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09650930/
• 关键词: sol-gel process; beta-diketone; chemical modification; photosensitivity; thin films; fine-patterning; diffraction gratings; selective coloration; 光アシストプロセス; 微細パタ-ニング

The present study has been carried out for the purpose of preparing functional thin films and establishing fine-patterning process by the novel photo-assisted process, with the following result :1)Al_2O_3 gel films modified with benzoylacetone are the most stable in an ambient atmosphere and has the highest photosensitivity among the modified A1_2O_3 gel films ; Benzophenone has been found to act as a sensitizer for these gel films.2)ESCA spectra have shown that the UV-irradiation of modified ZrO_2 gel films changes the bonding situation of carbon atom and decreases the carbon content in the gel films.3)Gel films in the Al_2O_3-SiO_2 system prepared from TEOS and modified Al-alkoxide show the photosensitive for the Al_2O_3 content of more than 30 mol%.4)Photosensitive PLZT gel films over 1 mum in thickness are obtainable by the repetition of coating and drying and can be patterned by the UV-irradiation and laching process.5)Selective coloration has been realized by the coating of SiO_2 gel films containing dye on ZrO_2 gel films irradiated through a mask, followed by rinse with water.6)Fabrication process of diffraction gratings has been developed using photosensitive gel films and the characteristics of the obtained gratings has been evaluated in terms of fabrication conditions.7)Hydrolysis of TEOS have been controlled with UV-irradiation in the presence of photo-acid generator and the possibility of fine-patterning has been found for SiO_2 gel films containing photo-acid generator.

本研究旨在利用新型光辅助工艺制备功能薄膜并建立精细图形化工艺。结果表明：1）苯甲酰丙酮改性的Al_2O_3凝胶薄膜在大气中最稳定，光敏性最高;二苯甲酮对凝胶膜起敏化作用。2）ESCA谱表明，紫外光辐照改性后的ZrO_2凝胶膜的光致变色性能明显增强。3）在Al_2O_3-SiO_2体系中，由正硅酸乙酯和改性醇铝制备的凝胶膜，在Al_2O_3含量大于30mol%时表现出光敏性通过反复涂布和干燥可获得厚度超过1 μ m的光敏PLZT凝胶膜，并可通过紫外照射和洗脱工艺进行图案化。5）通过SiO_2的涂布实现了选择性着色。2.在ZrO_2凝胶膜上通过掩模照射含有染料的凝胶膜，7）采用紫外光辐照控制TEOS的水解过程，并在一定条件下对光栅的衍射特性进行了评价。发现了含光生酸剂的SiO_2凝胶膜具有光生酸剂和精细图案化的可能性。

项目成果

N.Tohge and Y.Takama: "Direct Fine-Patterning of PZT Thin Films Using Photosensitive Gel Films Derived from Chemically Modified Metal-Alkoxides" J.Mater.Sci. : Mater.Electron.印刷中.

N. Tohge 和 Y. Takama：“使用化学改性金属醇盐衍生的 PZT 薄膜的直接精细图案化”J. Mater：Mater Electron。

峠 登: "光機能材料マニュアル(分担)" オプトロニクス社, 530 (1997)

Noboru Toge：《光学功能材料手册（共享）》Optronics，530（1997）

G.Zhao and N.Tohge: ""Effects of Addition of Photosensitizers on the Photosensitivity of Chemically Modified Al_2O_3 Gel Films" (Japanese)" J.Ceram.Soc.Jpn.106. 183-188 (1998)

G.Zhao 和 N.Tohge：“添加光敏剂对化学改性 Al_2O_3 凝胶薄膜光敏性的影响”（日文）”J.Ceram.Soc.Jpn.106。

N.Tohge, G.Zhao and F.Chida: "Photosensitive Gel Films Prepared by the CHemical Modification and Their Application to Surface-Relief Gratings" Thin Solid Flims. 印刷中.

N. Tohge、G. Zhu 和 F. Chida：“化学改性制备的光敏凝胶薄膜及其在表面浮雕光栅中的应用”薄固体薄膜正在出版。

N.Tohge, G.Zhao and F.Chiba: ""Photosensitive Gel Films Prepared by the Chemical Modification and Their Application to Surface-Relief Gratings"" Thin Solid Films. (In press).

N.Tohge、G.Zhao 和 F.Chiba：“化学改性制备的光敏凝胶薄膜及其在表面浮雕光栅中的应用”固体薄膜。