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Preparation of Functional Thin Films and Fine-Patterning by the Photo-Assisted Process

Preparation of Functional Thin Films and Fine-Patterning by the Photo-Assisted Process
光辅助工艺制备功能薄膜和精细图案
批准号:
09650930
负责人:
TOHGE Noboru
金额:
$2.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998

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中文摘要
翻译
本研究旨在利用光辅助技术制备功能薄膜和建立精细图案化工艺,结果表明:1)苯甲酰丙酮修饰的Al_2O_3凝胶膜在大气中最稳定,光敏性最好;2)ESCA光谱表明,紫外光照射改变了凝胶薄膜中碳原子的成键状态,降低了凝胶薄膜中的碳含量;3)以正硅酸乙酯和改性醇铝为原料制备的Al_2O_3-SiO_2体系凝胶薄膜对Al_2O_3含量在30mol%以上具有光敏性;4)PLZT凝胶薄膜厚度在1微米以上,可通过反复涂布和干燥得到,并可通过紫外光照射形成图案化5)将含有染料的SiO_2凝胶膜涂覆在经过掩膜照射的ZrO_2凝胶膜上,实现选择性变色,6)利用光敏凝胶膜制备了衍射栅,并对制备条件进行了评价。7)在光酸发生器存在下,用紫外光照射控制了正硅酸乙酯的水解,发现了含有光酸发生器的SiO_2凝胶膜形成微细图形的可能性。
英文摘要
The present study has been carried out for the purpose of preparing functional thin films and establishing fine-patterning process by the novel photo-assisted process, with the following result :1)Al_2O_3 gel films modified with benzoylacetone are the most stable in an ambient atmosphere and has the highest photosensitivity among the modified A1_2O_3 gel films ; Benzophenone has been found to act as a sensitizer for these gel films.2)ESCA spectra have shown that the UV-irradiation of modified ZrO_2 gel films changes the bonding situation of carbon atom and decreases the carbon content in the gel films.3)Gel films in the Al_2O_3-SiO_2 system prepared from TEOS and modified Al-alkoxide show the photosensitive for the Al_2O_3 content of more than 30 mol%.4)Photosensitive PLZT gel films over 1 mum in thickness are obtainable by the repetition of coating and drying and can be patterned by the UV-irradiation and laching process.5)Selective coloration has been realized by the coating of SiO_2 gel films containing dye on ZrO_2 gel films irradiated through a mask, followed by rinse with water.6)Fabrication process of diffraction gratings has been developed using photosensitive gel films and the characteristics of the obtained gratings has been evaluated in terms of fabrication conditions.7)Hydrolysis of TEOS have been controlled with UV-irradiation in the presence of photo-acid generator and the possibility of fine-patterning has been found for SiO_2 gel films containing photo-acid generator.
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会议论文
N.Tohge and Y.Takama: "Direct Fine-Patterning of PZT Thin Films Using Photosensitive Gel Films Derived from Chemically Modified Metal-Alkoxides" J.Mater.Sci. : Mater.Electron.印刷中.
N. Tohge 和 Y. Takama:“使用化学改性金属醇盐衍生的 PZT 薄膜的直接精细图案化”J. Mater:Mater Electron。
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通讯作者:
峠 登: "光機能材料マニュアル(分担)" オプトロニクス社, 530 (1997)
Noboru Toge:《光学功能材料手册(共享)》Optronics,530(1997)
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通讯作者:
G.Zhao and N.Tohge: ""Effects of Addition of Photosensitizers on the Photosensitivity of Chemically Modified Al_2O_3 Gel Films" (Japanese)" J.Ceram.Soc.Jpn.106. 183-188 (1998)
G.Zhao 和 N.Tohge:“添加光敏剂对化学改性 Al_2O_3 凝胶薄膜光敏性的影响”(日文)”J.Ceram.Soc.Jpn.106。
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通讯作者:
N.Tohge, G.Zhao and F.Chida: "Photosensitive Gel Films Prepared by the CHemical Modification and Their Application to Surface-Relief Gratings" Thin Solid Flims. 印刷中.
N. Tohge、G. Zhu 和 F. Chida:“化学改性制备的光敏凝胶薄膜及其在表面浮雕光栅中的应用”薄固体薄膜正在出版。
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共 32 条
    Fabricatio of Photonic Devices Using Photosensitive Gel Films and Their Properties
    • 批准号:
      12555179
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $3.58万
    • 财政年份:
      2000
    • 负责人:
      TOHGE Noboru
    • 依托单位:
    Photosensitivity Mechanism of Chemically Modified Gel Films and Their Application to the Fabrication of Micro-Devices
    • 批准号:
      11650866
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.3万
    • 财政年份:
      1999
    • 负责人:
      TOHGE Noboru
    • 依托单位:
    Preparation and Characterization of Ferroelectric Thin Films for Memories by the Chemical Process
    Preparation of Ferroelectric Films by the Sol-Gel Method
    • 批准号:
      62550570
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.22万
    • 财政年份:
      1987
    • 负责人:
      TOHGE Noboru
    • 依托单位:
    海外基金