Research on Three Dimensional Micro Structure Fabrication System by Moving X-ray Mask Lithography

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The purpose of this research is the construction of a microfabrication system and processing technology that realizes the 3-dimensional microstructure with free shaped wall that was not able to realize with the conventional technology. The research project has two objectives ; (1) Construction of the new moving mask X-rays processing system which can produce the 3-dimensional microstructure, and (2) Establishment of the technology to processes the microstructure with submicron order accuracy which has free shaped wall.The 3-dimensional micro structure processing system with the exposure area of 50 mm x 50 mm and substrate heating capability up to 200 ℃ under the vacuum of 10-^<-4> Pa were developed. Also the control device and program to realize the complicated stage movement by simultaneous control of the multi-stage was developed.The validity of the system was confirmed by fabricating several microstructures such as a micro lens array with diameter of 100 μm and focal length of 200 μm and a PTFE plate with projection array of 50 μm height and 50 μm pitch.