Research on Three Dimensional Micro Structure Fabrication System by Moving X-ray Mask Lithography

移动X射线掩模光刻三维微结构制造系统研究

• 批准号: 12355008
• 负责人: SUGIYAMA Susumu
• 金额: $ 23.6万
• 依托单位: Ritsumeikan University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 2000
• 资助国家: 日本
• 起止时间: 2000 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-12355008/
• 关键词: X-Ray; Microfabrication; Three Dimensional; Moving Mask; Micro Lens; LIGA; PTFE; 3次元; マイクロ; 加工; 露光; マイクロプリズム; マイクロノズル

The purpose of this research is the construction of a microfabrication system and processing technology that realizes the 3-dimensional microstructure with free shaped wall that was not able to realize with the conventional technology. The research project has two objectives ; (1) Construction of the new moving mask X-rays processing system which can produce the 3-dimensional microstructure, and (2) Establishment of the technology to processes the microstructure with submicron order accuracy which has free shaped wall.The 3-dimensional micro structure processing system with the exposure area of 50 mm x 50 mm and substrate heating capability up to 200 ℃ under the vacuum of 10-^<-4> Pa were developed. Also the control device and program to realize the complicated stage movement by simultaneous control of the multi-stage was developed.The validity of the system was confirmed by fabricating several microstructures such as a micro lens array with diameter of 100 μm and focal length of 200 μm and a PTFE plate with projection array of 50 μm height and 50 μm pitch.

本研究的目的是构建一种微细加工系统和加工技术，实现用常规技术无法实现的自由壁面三维微结构。该研究项目有两个目标：(1)建立能够产生三维微结构的新型移动掩模X射线处理系统；(2)建立具有自由形状墙的亚微米级微结构加工技术。开发了曝光面积为50 mm×50 mm，衬底加热能力高达200℃的三维微结构处理系统，该系统在真空度为10-1t；-4&gt；Pa的情况下进行。通过制作直径为100μm、焦距为200μm的微透镜阵列和高50μm、间距为50μm的聚四氟乙烯平板等微结构，验证了该系统的有效性。

项目成果

Hui You et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"Journal of Micromechatronics. JMM01-JS001(To be published). (2003)

尤慧等人：“用于3D微加工的多级深度X射线曝光系统”微机电一体化杂志。

Naoki Matsuzuka et al.: "Algorithm for Analyzing Optimal Mask Movement Pattern in Moving Mask Deep X-ray Lithography"2002 International Symposium on Micromechatronics and Human Science. 159-164 (2002)

Naoki Matsuzuka 等人：“移动掩模深 X 射线光刻中最佳掩模运动模式分析算法”2002 年国际微机电一体化和人类科学研讨会。

Naoki Matsuzuka et al.: "Effect of Development Process in Moving Mask Deep X-ray Lithography for 3D Microfabrication"Proc. of the High Aspect Ratio Micro Structures. (To be presented). (2003)

Naoki Matsuzuka 等人：“用于 3D 微加工的移动掩模深 X 射线光刻的开发过程的影响”Proc。

Hui You et al.: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication"Fourth International Workshop on High-Aspect-Ratio Micro-Structure Technology (Baden-Baden, June). 13-14 (2001)

Hui You等人：“Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication”第四届高深宽比微结构技术国际研讨会（巴登-巴登，六月）。

Y. Hirai, O. Tabata, S. Hafizovic and J. G. Korvink: "Measurement of PMMA Dissolution Rate and System Calibration for Predictive 3-D Simulation of Moving Mask Deep X-Ray Lithography"Proc of the High Aspect Ratio Micro Structures. (to be presented). (2003)

Y. Hirai、O. Tabata、S. Hafizovic 和 J. G. Korvink：“移动掩模深 X 射线光刻的预测 3D 模拟的 PMMA 溶解速率测量和系统校准”高深宽比微结构的研究成果。