MULTICHRGED ION PRODUCTION OF ECOLOGICAL MATERIALS AND THEIR APPLICATION TO MATERIAL PROCESSING

生态材料的多带离子生产​​及其在材料加工中的应用

• 批准号: 13680562
• 负责人: KATO Yushi
• 金额: $ 2.24万
• 依托单位: TOYAMA PREFECUTAL UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-13680562/
• 关键词: ECR; MULTICHARGED ION; SOLID MATERIAL SOURCE; Fe; Si; ECOLOGICAL MATERIALS; ?-FeSi_2; TiO_2; 環境低負荷; 半導体構成材料

Multiply charged ions of Fe and Si are produced from solid materials in a 2.45 GHz electron cyclotron resonance (ECR) ion source. The multicharged Fe ions have been produced by both directly sputtering the pure material and evaporating it in form of filament in the ECR plasma. The evaporator is mounted from the side wall. Argon gas is usually chosen for supporting gas, and the working pressure is about 10^<-4> 〜 10^<-3> Pa. The multicharged ions are extracted from the opposite side of mirror end against the target or the evaporator of the iron, occasionally, and then multicharged ion beam is formed. Extraction voltage is normally 10 kV, the sector magnet separates mass/charge, and the ion beams are collected by the Faraday cup. The ratio of total multicharged Fe ion to the total ion current attains to about 11% at the maximum.The Faraday cup is removed off from the beam line, and the ion beams can be introduced to a newly constructed part for ion irradiation of the substrate installed on the beam line. The beam profiles can be measured both vertically and horizon tally by wire probes, and the current density and the required dose can be estimated.We tried to from β-FeSi_2 and to enhance light catalytic performance of TiO_2 thin films by applying the multicharged Fe ion beams. The Si wafer is chosen for the substrate in the formation of silicides. As for TiO_2 substrate, we use thin films (350 〜 400mm) produced on the glasses or Si wafers by reactive sputtering in our different equipment. Therefore we recognized formation of β-FeSi_2 by x-ray diffractometer with thin-film optics in the high dose implantation. We also recognized enhancement of photo-catalytic performance, I. e., contact angle of the distilled water on TiO_2 thin films, in visible light region without degradation in UV light region.

在2.45GHz电子回旋共振（ECR）离子源中，从固体材料中产生了Fe和Si的多电荷离子。用直接溅射法和在ECR等离子体中蒸发法制备了多电荷Fe离子。蒸发器从侧壁安装。通常选用氩气作载气，工作压力约为10^<-4>~ 10^<-3>Pa。多电荷离子偶尔从镜端相对于靶或铁的蒸发器的相对侧被提取，然后形成多电荷离子束。提取电压通常为10 kV，扇形磁铁分离质量/电荷，离子束由法拉第杯收集。多电荷Fe离子总量占总离子流的比例最大可达11%左右，将法拉第杯从束线上取下，将离子束引入新构造的部分，对安装在束线上的衬底进行离子辐照。利用多电荷铁离子束，可以形成β-FeSi_2薄膜，提高TiO_2薄膜的光催化性能。在硅化物的形成中，选择Si晶片作为衬底。对于TiO_2基片，我们采用反应溅射法在玻璃或硅片上制备了350 ~ 400 mm的薄膜。因此，在高剂量注入过程中，用X射线衍射仪和薄膜光学仪证实了β-FeSi_2的形成。我们还认识到光催化性能的增强，I。例如，蒸馏水在TiO_2薄膜上的接触角，在可见光区，在紫外光区无降解。

项目成果

Eiji HONBO, Mitsuru MIYATA, Yushi KATO, Shigeyuki ISHII: "Application of Electron Cyclotron Resonance Plasma in Arched Magnetic Mirrors to Deposition of TiO_2 Thin Films"Review of Scientific Instruments. 73・2. 843-845 (2002)

Eiji HONBO、Mitsuru MIYATA、Yushi KATO、Shigeyuki ISHII：“电子回旋共振等离子体在拱形磁镜中沉积 TiO_2 薄膜”科学仪器评论 73・2。

Yushi Kato, Saori Sugiyama, Mitsuru Miyata, Shigeyuki Ishii: "Production of Multicharged Iron Ions from Solid and Application to Material Processing"Ion Implantation Technology-2002. 1(出版予定). (2003)

Yushi Kato、Saori Sugiyama、Mitsuru Miyata、Shigeyuki Ishii：“从固体中产生多电荷铁离子及其在材料加工中的应用”离子注入技术-2002（待出版）。

Saori Sugiyama, Yushi Kato, Shigeyuki Ishii: "Production of Multiply Charged Si and Fe Ions from Solid Materials by Sputtering and Evaporating Methods in a 2.45GHz ECR Source"Review of Scientific Instruments. 73・2. 542-544 (2002)

Saori Sugiyama、Yushi Kato、Shigeyuki Ishii：“通过 2.45GHz ECR 源中的溅射和蒸发方法从固体材料中产生多电荷 Si 和 Fe 离子”科学仪器评论 73・2。