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Development of removal Apparatuses of Exhausted Gases by Using Microwave Discharge and Photochemical Processes

Development of removal Apparatuses of Exhausted Gases by Using Microwave Discharge and Photochemical Processes
微波放电与光化学工艺废气去除装置的研制
批准号:
15310059
负责人:
TSUJI Masaharu
金额:
$9.92万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2005

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中文摘要
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英文摘要
The NO removal by a microwave-absorbent assisted discharge of an NO/N_2 mixture has been studied at NO and N_2 flow rates of 10 and 1000 sccm, respectively. Although discharge could be not be maintained at high N_2 pressure above 50 Torr without using microwave absorbents, stable microwave discharge could be maintained at an atmospheric pressure by using such a microwave absorbent as graphite, Zr, or W rod. One long rod or two short rods of absorbents were inserted into the center of the microwave cavity. Conversion of NO obtained by using two rods was higher than that by using one rod, though the branching ratios of such oxides as CO, CO_2, ZrO_2, and WO_3 were higher in the former case. A high NO conversion of 97% was achieved by using two short rods of graphite.Photochemical removal of N_2O and NO_2 by 193 am ArF excimer laser has been investigated in N_2 or air at atmospheric pressure. N2_O was nearly completely converted to N_2 and O_2 without NOx emission in N_2 and air at a low N_2O concentration of 100 ppm after laser irradiation for 15 mm at a laser power of 100 mJ/pulse. A reasonable agreement was found between experimental results and calculated values, indicating that our model calculation was valid. NO_2 was efficiently converted into N_2, O_2, and NO in N_2 or air in the NO_2 concentration range of 240-3000 ppm at a laser power of 80 mJ/pulse, and the relative formation ratios of N_2:NO in N_2 and air were 1:0.38〜0.79 and 1:0.41〜0.63, respectively. NO_2 was completely oxidized into N_2O_5 in air at low NO_2 pressure of 100 ppm. The major conversion process in air in this low NO_2 pressure range was oxidation of NO_2 into N_2O_5 via NO_3 due to effects of O_3.
期刊论文(22)
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Efficient photochemical conversion of N_2O into N_2 and O_2 by 193 nm ArF excimer laser in N_2 or Air at atmosphere pressure"
大气压下N_2O或空气中193 nm ArF准分子激光将N_2O高效光化学转化为N_2和O_2"
DOI: --
发表时间: 2005
期刊: Chemistry Letters 34・6
影响因子: --
作者: [M.Tsuji, H.Sako, K.Noda, M.Senda, T.Hamagami, T.Tsuji]
通讯作者: T.Tsuji
Development of Photochemical Removal Processes of N_2O and NO_2 by ArF excimer Laser in N_2 or Air at Atmospheric Pressure
大气压N_2或空气中ArF准分子激光光化学去除N_2O和NO_2工艺研究
DOI: --
发表时间: 2005
期刊: Report of Center of Advanced Instrumental Analysis No.23
影响因子: --
作者: [M.Tsuji, H.Sako, K.Noda, M.Senda, T.Tsuji]
通讯作者: T.Tsuji
大気圧窒素中でのマイクロ波放電によるN_2Oの分解処理 -マイクロ波吸収剤(Zr,W)の効果-"
常压氮气中微波放电分解处理N_2O-微波吸收剂(Zr,W)的影响-"
DOI: --
发表时间: 2003
期刊: 九州大学電離気体実験施設報告 第13号
影响因子: --
作者: [辻 正治, 辻 剛志, 熊谷 淳, 中野広輔]
通讯作者: 中野広輔
N_2O removal in N_2 or air by ArF excimer laser photolysis at atmospheric pressure
常压ArF准分子激光光解去除N_2或空气中的N_2O
DOI: --
发表时间: 2004
期刊: Journal of Hazardous Materials 108・3
影响因子: --
作者: [M.Tsuji, J.Kumagae, T.Tsuji, T.Hamagami]
通讯作者: T.Hamagami
16
    Study on cold adaptation strategies and secondary metabolites of Antarctic yeast
    • 批准号:
      16H06211
    • 项目类别:
      Grant-in-Aid for Young Scientists (A)
    • 资助金额:
      $15.31万
    • 财政年份:
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    • 依托单位:
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      25550056
    • 项目类别:
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    • 批准号:
      25286003
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $12.65万
    • 财政年份:
      2013
    • 负责人:
      TSUJI Masaharu
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      22310060
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
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    • 财政年份:
      2010
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    • 依托单位:
    海外基金