Development of Separated Pulsed Laser Deposition to Create Nanostructured Composite Materials of Oxides, Nitrides and Organics

开发分离式脉冲激光沉积技术来制造氧化物、氮化物和有机物的纳米结构复合材料

• 批准号: 15360171
• 负责人: EBIHARA Kenji
• 金额: $ 9.41万
• 依托单位: Kumamoto University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2003
• 资助国家: 日本
• 起止时间: 2003 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-15360171/
• 关键词: Separated PLD; ZnO thin film; Transparent conducting ZnO; ExB drift motion; OLED; ZnO-FET; Solid Li-ion battery; nanostructured ZnO; EXBドリフト運動; ZnO-TFT; 固体リチュウムイオン電池; パルスレーザアブレーション; ExBドリフト; ZnO; AZO; リチュウムイオンバッテリ; LiPON; Alq3; レーザアブレーショ

We have developed an alternative laser deposition technique for preparation of droplet-free thin films and fine particles. This separated pulsed laser deposition (SPLD) consists of an ablation chamber and a deposition chamber which are independently evacuated under different ambient gases.High quality ZnO films exhibiting both particle-free and uniform deposition were obtained such as at an ablation pressure of 5mTorr(Ar) and a deposition pressure of 10mTorr(O2). It is shown that, when the bias voltage and magnetic field are simultaneously applied in the deposition chamber, the ExB drift motion of about 70km/sec over the substrates contributes to deposit the smooth and high quality films. The deposited ZnO film showed high preferential orientation of (002) plane, optical band gap of 3.1eV, grain size of 42nm and surface roughness of 0.8nm. The XRD patterns for these samples show that the FWHM of the film at 500V has small value of 0.318° indicating good crystallinity. This SPLD is a promising technique for preparation of films and nanostructured particles.

我们已经开发出一种替代激光沉积技术，用于制备无液滴薄膜和细颗粒。该分离式脉冲激光沉积（SPLD）由烧蚀室和沉积室组成，烧蚀室和沉积室分别抽真空，在5 mTorr（Ar）和10 mTorr（O2）的烧蚀气压下，获得了无颗粒且沉积均匀的高质量ZnO薄膜。结果表明，当在沉积室中同时施加偏压和磁场时，ExB在基片上的漂移速度约为70 km/s，有利于存款出光滑、高质量的薄膜。ZnO薄膜的光学带隙为3.1eV，晶粒尺寸为42 nm，表面粗糙度为0.8nm。这些样品的XRD图案显示，在500 V下膜的FWHM具有0.318°的小值，表明良好的结晶度。这种SPLD是一种很有前途的制备薄膜和纳米结构颗粒的技术。

项目成果

Laser ablated plasma plume characteristics for photocatalyst TiO2 thin films preparation

• DOI: 10.1016/j.tsf.2005.08.042
• 发表时间: 2006-05
• 期刊: Thin Solid Films
• 影响因子: 2.1
• 作者: T. Ohshima;S. Nakashima;T. Ueda;Hiroharu Kawasaki;Y. Suda;K. Ebihara

Preparation of TiO2/WO3 multilayer thin film by PLD method and its catalytic response to visible light

• DOI: 10.1016/j.tsf.2005.08.312
• 发表时间: 2006-05
• 期刊: Thin Solid Films
• 影响因子: 2.1
• 作者: H. Shinguu;M. Bhuiyan;T. Ikegami;K. Ebihara

Effect of electric and magnetic fields on separated PLD method

电场和磁场对分离PLD方法的影响

• 发表时间: 2007
• 期刊: 10th International Symposium on High Pressure Low Temperature Plasma Chemistry,Saga,Japan,September 4-8,Proceeding book P.20
• 作者: Shingo Yamaguchi;Sang-Moo Park;Kenji Ebihara;Tomoaki Ikegami
• 通讯作者: Tomoaki Ikegami

K.Ebihara, T.Tanaka, T.Ikegami, K.Yamashita, Y.Oyama: "Application of the dielectric barrier discharge to detect defects in a Teflon coated metal surface"Journal of Physics D : applied physics. 36. 2883-2886 (2003)

K.Ebihara、T.Tanaka、T.Ikegami、K.Yamashita、Y.Oyama：“应用介质阻挡放电来检测特氟龙涂层金属表面的缺陷”物理学杂志 D：应用物理学。

K.Ebihara, T.Oshima, T.Ikegami, Raj K.Thareja: "C0-doping deposition of p-type ZnO thin films using KrF excimer laser ablation"Materials research society symposium proceedings. 747. 241-246 (2003)

K.Ebihara、T.Oshima、T.Ikegami、Raj K.Thareja：“使用 KrF 准分子激光烧蚀进行 p 型 ZnO 薄膜的 CO 掺杂沉积”材料研究学会研讨会论文集。