Development of Separated Pulsed Laser Deposition to Create Nanostructured Composite Materials of Oxides, Nitrides and Organics

我们开发了另一种激光沉积技术来制备无液滴的薄膜和细颗粒。这种分离式脉冲激光沉积(SpLD)由烧蚀室和沉积室组成，在不同的环境气体条件下独立抽真空，在烧蚀压力为5mTorr(Ar)、沉积压力为10mTorr(O2)的条件下，获得了无颗粒、均匀沉积的高质量氧化锌薄膜。结果表明，当偏置电压和磁场同时作用于沉积腔时，衬底上的ExB漂移运动约为70公里/秒，有助于沉积出光滑的高质量薄膜。沉积的氧化锌薄膜具有高度的(002)晶面择优取向，光学带隙为3.1 eV，晶粒尺寸为42 nm，表面粗糙度为0.8 nm。X射线衍射谱表明，薄膜在500V时的半高宽只有0.318°，具有较好的结晶性。这是一种很有前途的制备薄膜和纳米结构颗粒的技术。

We have developed an alternative laser deposition technique for preparation of droplet-free thin films and fine particles. This separated pulsed laser deposition (SPLD) consists of an ablation chamber and a deposition chamber which are independently evacuated under different ambient gases.High quality ZnO films exhibiting both particle-free and uniform deposition were obtained such as at an ablation pressure of 5mTorr(Ar) and a deposition pressure of 10mTorr(O2). It is shown that, when the bias voltage and magnetic field are simultaneously applied in the deposition chamber, the ExB drift motion of about 70km/sec over the substrates contributes to deposit the smooth and high quality films. The deposited ZnO film showed high preferential orientation of (002) plane, optical band gap of 3.1eV, grain size of 42nm and surface roughness of 0.8nm. The XRD patterns for these samples show that the FWHM of the film at 500V has small value of 0.318° indicating good crystallinity. This SPLD is a promising technique for preparation of films and nanostructured particles.