Development of atmospheric-pressure plasma applied mist chemical vapor deposition and ZnO thin film growth under room temperature using the method.

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A novel low temperature thin-film fabricating method was created and developed using mist chemical vapor deposition with atmospheric-pressure plasma. In the development, the dynamics of the mist droplets at a reaction area were analyzed and the reaction of the mist rapidly proceeded with high reaction efficiency was revealed. Moreover, a novel etching technique using the mist was developed as a related technology. The developed methods can save the usages of chemical resources and total energy.