Analysis of dynamics of particles suspended in non-equilibrium rf plasma space

非平衡射频等离子体空间中悬浮粒子的动力学分析

基本信息

  • 批准号:
    15360413
  • 负责人:
  • 金额:
    $ 9.28万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    2003
  • 资助国家:
    日本
  • 起止时间:
    2003 至 2005
  • 项目状态:
    已结题

项目摘要

The purpose of this study has been to understand the growth processes and transport phenomena of fine particles generated in a non-equilibrium plasma field by measuring the properties and motion of the particles. The research results in the research period are summarized as follows.1.Detailed measurements of the spatial distribution of fine particles in plasma was made possible by installing an in-line particle measurement system in a plasma reactor equipped with an in situ laser light scattering measurement system. The range of the measurable size and concentration of particles was determined by using test particles. The properties of fine particles could be measured for those generated in the plasma CVD processes for thin film fabrication of SiO_2 and Si. The transport and deposition behavior and trapping phenomena of fine particles suspended in plasma and post-plasma fields could be evaluated by visualization of the particles.2.The spatial distribution of several parameters characterizing a plasma field was obtained by measurements using plasma measurement devices and numerical simulation. Theoretical models for describing the processes of particle charging and coagulation were derived by considering the above parameters. Particle behavior predicted with the models was found to agree satisfactorily with measured results.3.A numerical simulator was prepared by deriving a particle transport model based on the various forces acting on charged fine particles in plasma. The model and the simulator were validated with measured results. A technique for controlling the transport of fine particles in plasma was also proposed and its efficiency was verified by building an actual device based on the technique.4.The model for coagulational growth of fine particles in plasma was analyzed in conjunction with the particle transport model, which made clear the mechanisms governing the size of fine particles generated in plasma.
本研究的目的是通过测量粒子的性质和运动来了解非平衡等离子体场中产生的细粒子的生长过程和输运现象。主要研究成果如下:1.通过在等离子体反应器中安装在线粒子测量系统,实现了对等离子体中细粒子空间分布的详细测量。通过使用测试颗粒来确定颗粒的可测量尺寸和浓度的范围。在等离子体CVD制备SiO_2和Si薄膜过程中产生的细小颗粒的性质可以测量。通过粒子的可视化,可以对悬浮在等离子体和等离子体后场中的微粒的输运、沉积行为和捕获现象进行评价。2.通过等离子体测量装置的测量和数值模拟,获得了表征等离子体场的几个参数的空间分布。通过考虑上述参数,推导出了描述颗粒荷电和凝聚过程的理论模型。利用粒子输运模型对等离子体中带电粒子的行为进行了预测,结果与实验结果吻合较好。3.根据等离子体中带电粒子所受的各种作用力,建立了粒子输运模型,并编制了数值模拟程序。模型和模拟器与实测结果进行了验证。提出了一种控制等离子体中细颗粒输运的技术,并通过搭建实际装置验证了该技术的有效性。4.结合颗粒输运模型,分析了等离子体中细颗粒的凝聚生长模型,阐明了等离子体中细颗粒尺寸的控制机理。

项目成果

期刊论文数量(71)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Dust Particle Collector Using Electrostatic Force for Particulate Contamination Control in Plasma Enhanced CVD Reactor.
使用静电力控制等离子体增强 CVD 反应器中的颗粒污染的粉尘颗粒收集器。
Suppression of Particulate Contamination for a PECVD Process by Using a New Type of Modulating Plasma.
使用新型调制等离子体抑制 PECVD 工艺中的颗粒污染。
柏原伸紀: "次世代プラズマプロセスの開発"化学工業. 55, 1. 26-30 (2004)
橿原伸明:“下一代等离子体工艺的开发” Kagaku Kogyo,55,1. 26-30 (2004)。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
PECVD成膜装置内での粒子汚染現象に対する操作流量の影響.
操作流量对 PECVD 沉积设备中颗粒污染现象的影响。
  • DOI:
  • 发表时间:
    2005
  • 期刊:
  • 影响因子:
    0
  • 作者:
    T.KAMEYAMA;K.SUGIURA;S.KAWAI;K.IWAI;林 豊
  • 通讯作者:
    林 豊
Particle Formation and Trapping Behavior in a TEOS/O_2 Plasma and Their Effects on Contamination of a Si Wafer.
TEOS/O_2 等离子体中的颗粒形成和捕获行为及其对硅片污染的影响。
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SHIMADA Manabu其他文献

SHIMADA Manabu的其他文献

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{{ truncateString('SHIMADA Manabu', 18)}}的其他基金

Development of a gas phase coating process for carbon nanotubes
碳纳米管气相涂覆工艺的开发
  • 批准号:
    24656471
  • 财政年份:
    2012
  • 资助金额:
    $ 9.28万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
PREPARATION OF FILMS WITH NANO POROUS STRUCTURES BY GAS-PHASE PLASMA SYNTHESIS AND TRANSPORT CONTROL OF HIGHLY-DISPERSED NANOPARTICLES
气相等离子体合成纳米多孔结构薄膜的制备及高分散纳米颗粒的输运控制
  • 批准号:
    21360380
  • 财政年份:
    2009
  • 资助金额:
    $ 9.28万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Development of a Monitoring Device of Wall Deposition and Evaluation of Deposition Behavior for Gaseous and Cluster Contaminants in Air
壁沉积监测装置的研制及空气中气态和团簇污染物沉积行为的评价
  • 批准号:
    12650755
  • 财政年份:
    2000
  • 资助金额:
    $ 9.28万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)

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Application of optical vortex spectroscopy to process plasma and development to new material creation
涡旋光谱在等离子体处理中的应用及新材料创造的发展
  • 批准号:
    18KK0079
  • 财政年份:
    2018
  • 资助金额:
    $ 9.28万
  • 项目类别:
    Fund for the Promotion of Joint International Research (Fostering Joint International Research (B))
Sputtering deposition using powder as a target and elucidation of its process plasma reaction mechanism
以粉末为靶材的溅射沉积及其过程等离子体反应机理的阐明
  • 批准号:
    15K21595
  • 财政年份:
    2015
  • 资助金额:
    $ 9.28万
  • 项目类别:
    Grant-in-Aid for Young Scientists (B)
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