PREPARATION OF FILMS WITH NANO POROUS STRUCTURES BY GAS-PHASE PLASMA SYNTHESIS AND TRANSPORT CONTROL OF HIGHLY-DISPERSED NANOPARTICLES
气相等离子体合成纳米多孔结构薄膜的制备及高分散纳米颗粒的输运控制
基本信息
- 批准号:21360380
- 负责人:
- 金额:$ 11.23万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (B)
- 财政年份:2009
- 资助国家:日本
- 起止时间:2009 至 2011
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Thin films having pores at a nano scale level are expected to show useful functions. In this study, we aimed at developing a novel gas-phase process for preparing such porous films. The particle synthesis in gas followed by their transport to and deposition on a substrate was experimentally investigated. Films with a uniform nano porous structure were found to be prepared by using non-agglomerated nanoparticles. The effects of particle size and agglomeration, deposition conditions, and heat treatment to the films were also clarified, leading to obtaining the directions for controlling the preparation of porous films
具有纳米级孔的薄膜有望显示出有用的功能。在这项研究中,我们旨在开发一种新的气相工艺来制备这种多孔膜。实验研究了气体中粒子的合成、迁移和沉积过程。采用非团聚的纳米颗粒制备了具有均匀纳米孔结构的薄膜。阐明了颗粒大小和团聚、沉积条件、热处理对多孔膜的影响,得出了控制多孔膜制备的方向
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Plasma Synthesis of Composite Films Using Gaseous and Aerosol Precursors
使用气态和气溶胶前体等离子体合成复合薄膜
- DOI:
- 发表时间:2010
- 期刊:
- 影响因子:0
- 作者:Shimada;M.
- 通讯作者:M.
Defect Grown from aFine Particle as Its Nucleus on a Si Wafer
硅晶片上以细颗粒为核生长的缺陷
- DOI:
- 发表时间:2010
- 期刊:
- 影响因子:0
- 作者:Hiroshi Nagaike;Tsuyoshi Moriya;Manabu Shimada;Keigo Nakashima and Katsuomi Tanahashi
- 通讯作者:Keigo Nakashima and Katsuomi Tanahashi
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SHIMADA Manabu其他文献
SHIMADA Manabu的其他文献
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{{ truncateString('SHIMADA Manabu', 18)}}的其他基金
Development of a gas phase coating process for carbon nanotubes
碳纳米管气相涂覆工艺的开发
- 批准号:
24656471 - 财政年份:2012
- 资助金额:
$ 11.23万 - 项目类别:
Grant-in-Aid for Challenging Exploratory Research
Analysis of dynamics of particles suspended in non-equilibrium rf plasma space
非平衡射频等离子体空间中悬浮粒子的动力学分析
- 批准号:
15360413 - 财政年份:2003
- 资助金额:
$ 11.23万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Development of a Monitoring Device of Wall Deposition and Evaluation of Deposition Behavior for Gaseous and Cluster Contaminants in Air
壁沉积监测装置的研制及空气中气态和团簇污染物沉积行为的评价
- 批准号:
12650755 - 财政年份:2000
- 资助金额:
$ 11.23万 - 项目类别:
Grant-in-Aid for Scientific Research (C)














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