High speed synthesis of diamond using in-liquid plasma
使用液体等离子体高速合成金刚石
基本信息
- 批准号:17560636
- 负责人:
- 金额:$ 2.28万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2005
- 资助国家:日本
- 起止时间:2005 至 2007
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
1. High speed synthesis of diamondDiamond synthesis experiment was performed using in-liquid plasma process by changing experimental parameters (concentration of alcohol solution, substrate temperature, electric power and frequency, gap space between substrate and electrode). By increasing the pressure and the plasma power, the far higher growth rate was achieved than the conventional CVD diamond processes. Effective introduction of Microwave to electrode was also achieved. When the electric power of 300 W and 2.45 GHz microwave was irradiated into the methanol solution by the 6 mm electrode, the diamond film that has the thickness of 33 μm and width of 5 mm could be synthesized on the silicon substrate in 10 min. Growth rate was estimated as 200 μm/h. The result was submitted as a patent.2. Synthesis of silicon carbide (SiC)The good SiC crystals were synthesized by the chemical process that the hydrogen radicals pull up the impurity oxygen atoms contained in the forming SiC film. The graphite crystals were simultaneously synthesized between the SIC crystal grains. This chemical process was proved by the investigation of the plasma spectra.3. Synthesis of aluminum nitride (AIN)In-liquid plasma was generated in the water solution of AiCl_3 and NH_4X (X: anion) and AIN synthesis experiment was investigated. Alumina (Al_2O_3) could be synthesized; however, AIN could not be synthesized. It is important that the distance between aluminum and nitrogen atoms become closed when in-liquid plasma chemical reaction occurs.
1.金刚石的高速合成通过改变实验参数(乙醇溶液浓度、衬底温度、电功率和频率、衬底与电极之间的间隙),进行了液内等离子体法合成金刚石的实验。通过提高气压和等离子体功率,获得了远高于传统CVD金刚石工艺的生长速度。还实现了微波在电极上的有效导入。当功率为300W、频率为2.45 GHz的微波经6 mm电极辐照到甲醇溶液中时,在10min内即可在硅衬底上合成厚度为33μm、宽度为5 mm的金刚石薄膜。生长速度估计为200μm/h。该结果已作为专利提交。碳化硅的合成通过氢自由基吸起形成的碳化硅薄膜中的杂质氧原子的化学过程,得到了良好的碳化硅晶体。在碳化硅颗粒之间同时合成了石墨晶体。等离子体光谱的研究证实了这一化学过程。在AlCl3和NH4X(X:阴离子)的水溶液中,用液态等离子体合成氮化铝(AIN),并进行了实验研究。可以合成氧化铝(Al_2O_3),但不能合成AIN。重要的是,当发生液态等离子体化学反应时,铝和氮原子之间的距离变得更近。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
In-liquid plasma chemical deposition
液内等离子体化学沉积
- DOI:
- 发表时间:2007
- 期刊:
- 影响因子:0
- 作者:Yoshiyuki Takahashi;Hiromichi Toyota;Shinfuku Nomura;Shinobu Mukasa
- 通讯作者:Shinobu Mukasa
「研究成果報告書概要(和文)」より
摘自《研究结果报告摘要(日文)》
- DOI:
- 发表时间:2005
- 期刊:
- 影响因子:0
- 作者:Kawauchi;et. al.;Nishimura et al.;Dezawa et al.;Yoshizawa et al.;星野 幹雄;星野 幹雄
- 通讯作者:星野 幹雄
Submerged synthesis of diamond in liquid alcohol plasma
- DOI:10.1016/j.diamond.2008.04.010
- 发表时间:2008-11
- 期刊:
- 影响因子:4.1
- 作者:H. Toyota;S. Nomura;Y. Takahashi;S. Mukasa
- 通讯作者:H. Toyota;S. Nomura;Y. Takahashi;S. Mukasa
High Frequency and Microwave Plasma in Water,
水中的高频和微波等离子体,
- DOI:
- 发表时间:2007
- 期刊:
- 影响因子:0
- 作者:Shinfuku Nomura;et. al.
- 通讯作者:et. al.
Radio Frequency Plasma in Water
- DOI:10.1143/jjap.45.8864
- 发表时间:2006-11
- 期刊:
- 影响因子:1.5
- 作者:T. Maehara;H. Toyota;M. Kuramoto;A. Iwamae;Atsushi Tadokoro;S. Mukasa;H. Yamashita;A. Kawashima;S. Nomura
- 通讯作者:T. Maehara;H. Toyota;M. Kuramoto;A. Iwamae;Atsushi Tadokoro;S. Mukasa;H. Yamashita;A. Kawashima;S. Nomura
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TOYOTA Hiromichi其他文献
TOYOTA Hiromichi的其他文献
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{{ truncateString('TOYOTA Hiromichi', 18)}}的其他基金
Synthesis of diamond film by in-liquid plasma CVD
液内等离子体CVD法合成金刚石薄膜
- 批准号:
23360326 - 财政年份:2011
- 资助金额:
$ 2.28万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Interaction between Bubble and Substrate by In-Liquid Plasma CVD Process
液内等离子体 CVD 工艺中气泡与基材之间的相互作用
- 批准号:
20360335 - 财政年份:2008
- 资助金额:
$ 2.28万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
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