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Development and applications of a novel low-temperature plasma source under atmospheric pressure

Development and applications of a novel low-temperature plasma source under atmospheric pressure
新型常压低温等离子体源的研制及应用
批准号:
20540479
负责人:
FUJIWARA Tamiya
金额:
$2.83万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010

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中文摘要
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英文摘要
A novel atmospheric pressure plasma source has been developed. The source has an array of many copper dots with floating potential on the dielectric barrier surface. The floating electrodes, that is, the copper dots decreased the breakdown voltage by about 20% as compared with barrier discharge. It was clarified that a discharge occur around edges of copper dot and it move to a region separated from floating electrodes and at a short distance from them as time pass. It was found from a preliminary experiment of surface treatment that this plasma source is applicable to applications in the field of low-temperature plasma.
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Trend of Large-Area, Atmospheric-Pressure, Plasma Source
大面积、大气压、等离子体源的发展趋势
DOI: --
发表时间: 2009
期刊: 電気学会論文誌A 129
影响因子: --
作者: [T. Sano, T. Sakuyama, S. Ingle, S. Rodriguez, and T. Yamasaki, T.Fujiwara]
通讯作者: T.Fujiwara
DOI: 10.1063/1.2965497
发表时间: 2008-08
期刊: Physics of Plasmas
影响因子: 2.2
作者: [Kazunori Takahashi;K. Oguni;H. Yamada;T. Fujiwara]
通讯作者: Kazunori Takahashi;K. Oguni;H. Yamada;T. Fujiwara
Effect of Micro Hydrodynamic Flow in Microgap Discharge at Atmospheric Pressure
大气压下微间隙放电中微动水流的影响
DOI: --
发表时间: 2008
期刊: Plasma and Fusion Research 3(Article No. 007)
影响因子: --
作者: [S. Mukaigawa, K.Nawa, H. Ito, K. Takaki, T. Fujiwara]
通讯作者: T. Fujiwara
DOI: 10.1109/tps.2004.924582
发表时间: 2008-08
期刊: IEEE Transactions on Plasma Science
影响因子: 1.5
作者: [K. Takaki;K. Nawa;S. Mukaigawa;T. Fujiwara;T. Aizawa]
通讯作者: K. Takaki;K. Nawa;S. Mukaigawa;T. Fujiwara;T. Aizawa
8
    New Technology of Atmospheric plasmas using capacity coupled multi discharge and their applications
    • 批准号:
      17560244
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.18万
    • 财政年份:
      2005
    • 负责人:
      FUJIWARA Tamiya
    • 依托单位:
    High density and large area atmospheric plasma production and the industrial application by using a variable energy type barrier discharge
    • 批准号:
      14380207
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $3.97万
    • 财政年份:
      2002
    • 负责人:
      FUJIWARA Tamiya
    • 依托单位:
    DEVELOPMENT OF COMPACT EXHUST GAS TREATMENT EQUIPMENT FOR DIESEL ENGINE USING DIELECTRIC BARRIER DISCHARGE
    • 批准号:
      12680470
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.37万
    • 财政年份:
      2000
    • 负责人:
      FUJIWARA Tamiya
    • 依托单位:
    DEVELOPMENT OF COMPACT EXHUST GAS TREATMENT EQUIPMENT FOR DIESEL ENGINE USING DIELECTRIC BARRIER DISCHARGE
    • 批准号:
      09555084
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $5.63万
    • 财政年份:
      1997
    • 负责人:
      FUJIWARA Tamiya
    • 依托单位:
    海外基金