Investigation of process reaction mechanism in plasma nitridation with laser diagnostics

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Plasma oxidation and nitridation are key technology in the silicon technology. In this study, we have successfully measured the absolute densities of activated species, such as oxygen and nitrogen atoms in these processing plasmas, with plasma diagnostics methods such as vacuum ultraviolet laser absorption spectroscopy, etc. Moreover, a technique with a micro hollow cathode lamp has been made technological advances for measuring the metastable atomic radicals.