Clarification of surface reactions by interaction between ions and radicals in reactive plasma processes

本研究利用真空紫外吸收光谱研究了氢原子的空间密度分布和表面损失概率。结果表明，在纯H_2气体或H_2和N_2混合气体的电容耦合等离子体中，氢原子在上下电极间的空间分布。此外，定量地阐明了SiH_4/H_2电感耦合等离子体化学气相沉积过程中硅薄膜上氢原子的表面损失概率。

In this study, the spatial density distribution and surface loss probability of hydrogen atoms have been investigated by using vacuum ultraviolet absorption spectroscopy. From the results, we clarified the spatial distribution of hydrogen atom between upper and bottom electrodes in capacitively coupled plasmas with pure H_2 gas or H_2 and N_2 mixture gas. Moreover, the surface loss probability of hydrogen atom on silicon thin films during plasma chemical vapor deposition with inductively coupled SiH_4/H_2 plasma was quantitatively clarified.