Ultra-high speed opto-electronic devices
Ultra-high speed opto-electronic devices
批准号:
21560365
负责人:
TAKANASHI Yoshifumi
金额:
$3.41万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
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英文摘要
We have fabricated HEMT's with a strained InGaAs, whose mole fraction is close to that of InAs, as the channel have been fabricated and characterized high-frequency performances using a network analyser. HEMT's with the gate length of 0.1μm exhibited a current cut-off frequency(fT) research ranging over 200 GHz. We have also fabricated MSM-PD's with a strained InGaAs channel and characterized the optical response using a fiber laser with a bandwidth of 400 femt-seconds. MSM-PD's with a L & S of 0.2/0.6μm exhibited a pulse width less than 20 psec. This is because the strained InGaAs has a relatively high drift velocity of electrons. In addition, these MSM-PD's exhibited a responsivity more than one regardless of the channel width as thin as 10 nm. In this way, ultra-high speed OEIC's can be realized by simultaneously fabricating MSM-PD's and HEMT's on the same epitaxial wafer. Therefore, an application of these MSM-PD's to high-speed OEIC's for use in broad-band optical communication systems is expected.
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Dependence of Optical Response Time on Gate-to-Source Voltage for InAlAs/InAs/InGaAs Pseudomorphic High Electron
InAlAs/InAs/InGaAs 赝晶高电子光学响应时间对栅源电压的依赖性
DOI:
--
发表时间:
2010
期刊:
Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials
影响因子:
--
作者:
[Takahisa Ando, Hirohisa Taguchi, Kazuya Uchimura, Miho Mochiduki, Tsutomu Iida and Yoshifumi Takanashi]
通讯作者:
Tsutomu Iida and Yoshifumi Takanashi
In0.75Ga0.25As/In0.53Ga0.47As同一基板上に作製したPHEMTの周波数特性
在同一 In0.75Ga0.25As/In0.53Ga0.47As 衬底上制作的 PHEMT 频率特性
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[山崎陽一, 是枝勇太, 西尾結, 遠藤裕, 佐藤宏一, 芳沢研哉, 田口博久, 高梨良文]
通讯作者:
高梨良文
DOI:
10.1007/s11664-010-1489-5
发表时间:
2011-01
期刊:
Journal of Electronic Materials
影响因子:
2.1
作者:
[T. Sakamoto;T. Iida;Shota Kurosaki;K. Yano;Hirohisa Taguchi;K. Nishio;Y. Takanashi]
通讯作者:
T. Sakamoto;T. Iida;Shota Kurosaki;K. Yano;Hirohisa Taguchi;K. Nishio;Y. Takanashi
Materials Research Society Symposium Proceedings 1108
材料研究学会研讨会论文集 1108
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[Nobuhito Wakimura, Yugo Nakagawa, Hirohisa Taguchi, Tsutomu Iida, and Yoshifumi Takanashi]
通讯作者:
and Yoshifumi Takanashi
Characteristics of PHEMTs and MSM photodetectors simultaneously fabricated on the same epitaxial wafer with In0.75Ga0.25As/InGaAs channel layer
在同一外延片上同时制作具有 In0.75Ga0.25As/InGaAs 沟道层的 PHEMT 和 MSM 光电探测器的特性
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[Hirohisa Taguchi, Yuta koreeda, Yutaka Endo, kouichi Sato, Kenya Yoshizawa, Yui Nishio, Tsutomu Iida and Yoshifumi Takanashi]
通讯作者:
Tsutomu Iida and Yoshifumi Takanashi
共 24 条
Fabrication of Mg2Si thermal-to-electric energy conversion device using die-casting sysnthesis method
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批准号:17360130
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.7万
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财政年份:2005
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负责人:TAKANASHI Yoshifumi
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依托单位:
Development of the discrete electric power-generator from exhaust or waste heat sources using ecologically friendly semiconductors
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批准号:13650317
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.77万
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财政年份:2001
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负责人:TAKANASHI Yoshifumi
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依托单位:
海外基金