Development of the discrete electric power-generator from exhaust or waste heat sources using ecologically friendly semiconductors
使用生态友好型半导体开发废气或废热源分立式发电机
基本信息
- 批准号:13650317
- 负责人:
- 金额:$ 0.77万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2001
- 资助国家:日本
- 起止时间:2001 至 2003
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Mg2Si, an ecologically friendly semiconductor, is a promising thermoelectric material at temperatures ranging 'rom 500 to 800 K.Mg2Si crystals were grown by the vertical Bridgman method in various crucibles made of quartz, alumina, SiNx-coated quartz, CVD pyrolytic graphite, CVD SiC-coated graphite in order to minimize the reaction and sticking of molten Mg-Si during growth.Congruent crystallization was derived from a stoichiometric melt of Mg2Si and incongruent crystallization was derived from nonstoichiometric melts having Mg : Si ratios of 85 : 1 5, 70:30, and 60:40.Grown samples were characterizedby x-ray diffraction and electron-probe microanalysis, and their power factors were calculated from the Seebeck coefficients and electrical-conductivities measured from room temperature to 773 K.The grown crystals were single crystal and showed n-type conductivity in undoped condition. A sample derived from a stoichiometric melt had a Seebeck coefficient of -470 mV/K, while the highest power factor, 1.1x10-5 W/cmK2 at 373 K, was obtained for the sample derived from an incongruent melt with an Mg : Siratio of 70:30.The use of the graphite based crucibles such as pyrolytic and SiC coated graphites caused the carbon incorporati in the grown crystals, resulting in an increase in the Seebeck coefficient and the electrical conductivity.
Mg_2Si是一种环境友好的半导体材料,在500 ~ 800 K温度范围内是一种很有前途的热电材料。采用垂直布里奇曼法,在石英坩埚、氧化铝坩埚、SiNx涂层石英坩埚、CVD热解石墨坩埚CVD SiC涂层石墨,以最大限度地减少熔融Mg-生长过程中的Si。一致结晶源自化学计量比的Mg 2Si熔体,而不一致结晶源自Mg:Si比为85:15、70:30和60:30的非化学计量比熔体。40.通过X射线衍射和电子探针显微分析来表征生长的样品,功率因数由Seebeck系数和电-从室温到773 K测量的电导率。生长的晶体是单晶,并在未掺杂的条件下表现出n型导电性。采用化学计量比熔体制备的样品的Seebeck系数为-470 mV/K,而采用Mg:Si = 70:30的非全等熔体制备的样品在373 K时的功率因数最高,为1.1 × 10 -5 W/cmK 2。
项目成果
期刊论文数量(2)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
S.Kishino, T.Iida, T.Kuji, Y.Takanashi: "Crystal growth of orthorhombic BaSi_2 by the vertical Bridgman method"Thin Solid Films. (In press). (2004)
S.Kishino、T.Iida、T.Kuji、Y.Takanashi:“通过垂直布里奇曼法进行斜方 BaSi_2 的晶体生长”固体薄膜。
- DOI:
- 发表时间:
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- 影响因子:0
- 作者:
- 通讯作者:
M.Yoshinaga, T.Iida, M.Noda, T.Endo, Y.Takanashi: "Bulk crystal growth of Mg_2Si by the vertical Bridgman method"Thin Solid Films. (In press). (2004)
M.Yoshinaga、T.Iida、M.Noda、T.Endo、Y.Takanashi:“通过垂直布里奇曼法进行 Mg_2Si 的块状晶体生长”固体薄膜。
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TAKANASHI Yoshifumi其他文献
TAKANASHI Yoshifumi的其他文献
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{{ truncateString('TAKANASHI Yoshifumi', 18)}}的其他基金
Ultra-high speed opto-electronic devices
超高速光电器件
- 批准号:
21560365 - 财政年份:2009
- 资助金额:
$ 0.77万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Fabrication of Mg2Si thermal-to-electric energy conversion device using die-casting sysnthesis method
压铸合成法制造Mg2Si热电能量转换装置
- 批准号:
17360130 - 财政年份:2005
- 资助金额:
$ 0.77万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
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