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Digital monitoring for prognostics to defects due to atomic migration

Digital monitoring for prognostics to defects due to atomic migration
对原子迁移导致的缺陷进行数字监测
批准号:
21760068
负责人:
SHIBUTANI Tadahiro
金额:
$2.66万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2010

项目摘要

项目成果

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中文摘要
翻译
本项目的目的是建立一种原位观察原子输运引起的小缺陷现象的方法学。关键技术是在一定的环境条件下预测缺陷的位置。本文对掺银TiN表面光洁度进行了压力诱导TiN晶须试验。由于掺杂银可以减少锡晶须,因此不适合用于锡晶须的监测。另一方面,在电流作用下的腐蚀样品中观察到了长晶须。TiN晶须的驱动力,即表面光洁度中的应力梯度,是由表面氧化物和扭曲电流产生的。基于锡晶须形成的上述机理,提出了利用微旋转仪和原子力显微镜对锡晶须进行原位观察的实验系统。
英文摘要
The aim of this project is to establish a methodology of in-situ observation for phenomena of small defects due to atomic transportation. Key technology is to predict the site of defects under some environmental conditions. In this study, pressure-induced tin whisker test was conducted for silver doped tin surface finish. Since doped silver can mitigates tin whiskers, it is not suitable for monitoring of tin whisker. On the other hand, long whiskers were observed under corroded samples with electric currents. The driving force of tin whiskers, stress gradient in the surface finish, was generated by surface oxides and distorted electric currents. Based on the above mechanism of tin whiskers, In-situ observation system for tin whiskers were proposed by using micro-manipurator and atomic force microscopy.
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会议论文
Tin Whisker Reliability in Microelectronics
微电子领域锡晶须的可靠性
DOI: --
发表时间: 2009
期刊: Micromaterials and Nanomaterials No.9
影响因子: --
作者: [T.Shibutani, et.al.]
通讯作者: et.al.
Effect of Grain Size on Pressure Induced Tin Whisker Formation
晶粒尺寸对压力诱导锡晶须形成的影响
DOI: --
发表时间: 2010
期刊: IEEE Transactions on Electronics Packaging & Manufacturing Vol.33, Issue 3
影响因子: --
作者: [平岡直樹, 松崎亮介, 轟章, 水谷義弘, Tadahiro Shibutani]
通讯作者: Tadahiro Shibutani
錫ウィスカ発生におけるAg添加の影響
Ag添加量对锡晶须产生的影响
DOI: --
发表时间: 2009
期刊: 日本機械学会2009年度次大会講演論文集 No.09-1
影响因子: --
作者: [奈良崎史貴, 礒島伸, 薩摩順吉, 澁谷忠弘]
通讯作者: 澁谷忠弘
Effect of grain size on pressure induced tin whiskers
晶粒尺寸对压力诱导锡晶须的影响
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [Lei Du, Tomohiro Sogabe, Shao-Liang Zhang, 澁谷忠弘]
通讯作者: 澁谷忠弘
Damage mechanism of thin film at elevated temperature due to atomic migration and evolution of microstructure
  • 批准号:
    19760060
  • 项目类别:
    Grant-in-Aid for Young Scientists (B)
  • 资助金额:
    $1.79万
  • 财政年份:
    2007
  • 负责人:
    SHIBUTANI Tadahiro
  • 依托单位:
海外基金