Development of functional polyimides for printabe electronics

用光照射法，不经显影，成功地对各种含添加剂的聚酰亚胺进行了表面浮雕图案化。 可以通过选择添加剂来控制正色调或负色调。 图案形成的机理是基于受光照射区域中酸或碱的产生影响的聚合物的Tg变化。 聚酰亚胺的表面润湿性也由光照射控制。 这些材料被用作可印刷电子制造的有前途的步骤。

Surface relief patterning of various polyimides containing additives was successfully performed by only photoirradiation, without development process. positive or negative tone can be controlled by the selection of the additives. Mechanism of the patten formation is based on the Tg change of the polymer affected by the generation of an acid or a base in the photoirradiated area. Surface wettability of the polyimides was also controlled by photoirradiation. Those materials are used as the promising step for printable electronics fabrication.