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Study on crystalline growth of phase transition oxides with various oxidation states and their electric transport characteristics

Study on crystalline growth of phase transition oxides with various oxidation states and their electric transport characteristics
不同氧化态相变氧化物的晶体生长及其电输运特性研究
批准号:
23560013
负责人:
OKIMURA Kunio
金额:
$3.41万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2013

项目摘要

项目成果

OKIMURA Kunio的其他基金

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中文摘要
翻译
在本项目中,我们研究了具有绝缘体-金属过渡(IMT)的二氧化钒(VO2)和具有不同氧化态(VnO2n-1和VnO2n+1)的氧化相。利用质量流量控制器对氧分压进行精细控制,成功地在蓝宝石和硅衬底上制备了V2O3晶体薄膜。在适当温度和时间的氧气气氛中后退火,得到的V2O3薄膜转变为VnO2n-1和VnO2n+1相。通过研究,部分阐明了VnO2n-1和VnO2n+1的电输运特性,说明了氧化钒薄膜中相共存的意义。
英文摘要
In this project, we studied vanadium dioxide (VO2) with insulator-metal transition (IMT) and related oxide phases which possess different oxidation states such as VnO2n-1 and VnO2n+1. By using mass flow controller which enabled fine control of oxygen partial pressure, we successfully fabricated crystalline V2O3 films on sapphire and silicon substrates. Obtained V2O3 films transformed to VnO2n-1 and VnO2n+1 phases by post-annealing in oxygen atmosphere with adequate temperature and time. Through the study, electrical transport characteristics of VnO2n-1 and VnO2n+1 were partially clarified and the significance of phase coexistence in vanadium oxide thin films was shown.
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会议论文
Electrical Properties of VO_2 Thin Films and Post-annealing Effects on the Growth of Non-stoichiometric VOx
VO_2薄膜的电性能及后退火对非化学计量VOx生长的影响
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [Hiromichi Hoshina, Shinya Ishii, Yusuke Morisawa, Harumi Sato, Isao Noda, Yukihiro Ozaki, Chiko Otani, TAKUMA TAKIMOTO,KOJI TAKESHITA,SEIJI NAKAMURA AND TSUGUNORI OKUMURA, Nurul Hanis Azhan and Kunio Okimura]
通讯作者: Nurul Hanis Azhan and Kunio Okimura
TiNバッファー層によるVO_2薄膜の結晶成長及び転移特性の改善
TiN缓冲层改善VO_2薄膜晶体生长和转变性能
DOI: --
发表时间: 2014
期刊:
影响因子: --
作者: [K. Miura, Y. Iguchi and Y. Kawamura, モハメッドシュルズミヤ,沖村邦雄]
通讯作者: モハメッドシュルズミヤ,沖村邦雄
Vanadium Dioxide Film Growth onn Titanium Metal Layer on Si (100) by Inductively Coupled Plasma Assisted Sputtering Method
电感耦合等离子体辅助溅射法在 Si (100) 上钛金属层上生长二氧化钒薄膜
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [D.Sekiba, H.Yonemura, S.Ogura, M. Matsumoto, Y.Kitaoka, Y.Yokoyama, H.Matsuzaki, T.Narusawa, K. Fukutani, Md. Suruz Mian and Kunio Okimura]
通讯作者: Md. Suruz Mian and Kunio Okimura
Growth of phase transition VO_2 films with M_2 phase in inductively coupled plasma assisted reactive sputtering
电感耦合等离子体辅助反应溅射中M_2相相变VO_2薄膜的生长
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [T. Watanabe, Md. Suruz Mian, K.Okimura and J. Sakai]
通讯作者: K.Okimura and J. Sakai
36
    Study on crystalline growth of phase transition oxide and electric field-induced switching phenomena
    • 批准号:
      20560016
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $3.08万
    • 财政年份:
      2008
    • 负责人:
      OKIMURA Kunio
    • 依托单位:
    Crystal with Metal-Insulator Transition by Plasma Processing Technique and Its Application to Switching Devices
    • 批准号:
      18540495
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.31万
    • 财政年份:
      2006
    • 负责人:
      OKIMURA Kunio
    • 依托单位:
    Study on the Epitaxial Growth of Oxide Films in Sputtering focusing on Negative Oxygen Ion Behavior
    • 批准号:
      16540454
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.24万
    • 财政年份:
      2004
    • 负责人:
      OKIMURA Kunio
    • 依托单位:
    海外基金