Development of the automatic R&D system for reaction processes

在本研究中，我们开发了CVD过程反应机理的自动模拟系统，以减少半导体行业的人工需求，提高研发速度。对影响系统性能的各种优化算法进行了评估，发现实数编码遗传算法是系统实现的候选算法。因此，我们成功地提高了系统的计算精度和成本。此外，为了将该系统应用于具有复杂物理和化学现象的商用CVD反应器，我们还提出并评估了该系统的联锁机制和CFD模拟器。

In this study, we developed the automatic system to model the reaction mechanisms of CVD processes, in order to decrease the labor requirement and increase the speed of R&D in semiconductor industries. We evaluated the various optimization algorithms, which is dominant to the performance of the system, and found the real-coded genetic algorithms as the candidates for the implementation to the system. As a result, we successfully improved both the accuracy and the cost of the calculations of the system. In addition, we proposed and evaluated a mechanism for interlocking the system and a CFD simulator in order to apply the system to the commercial CVD reactor with complex physical and chemical phenomena.