Generation of high-density plasma using electrode with narrow slitand its application to grooving

在常压条件下，由于气体分子的平均自由程小，可以在电极周围局部产生等离子体。然而，由于针状电极或非常细的线电极的热限制，产生用于高速率蚀刻的小等离子体特别是小于1mm是非常困难的。因此，我们提出了一种具有窄缝的新型电极，并成功地产生了小于0.1 mm的窄槽。

A plasma can be generated locally around the electrode under the condition of atmospheric pressure because of the small mean free path of gas molecules. However, generation of small plasma for high-rate etching especially less than 1 mm is very difficult due to thermal limitations of needle-like electrodes or very thin wire electrodes. Thus, we proposed a novel electrode with a narrow slit and succeeded in generation of a narrow groove less than 0.1 mm.