Generation of high-density plasma using electrode with narrow slitand its application to grooving

窄缝电极产生高密度等离子体及其在切槽中的应用

• 批准号: 23656104
• 负责人: SANO Yasuhisa
• 金额: $ 2.41万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Exploratory Research
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2012
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23656104/
• 关键词: 大気圧プラズマ; 溝加工

A plasma can be generated locally around the electrode under the condition of atmospheric pressure because of the small mean free path of gas molecules. However, generation of small plasma for high-rate etching especially less than 1 mm is very difficult due to thermal limitations of needle-like electrodes or very thin wire electrodes. Thus, we proposed a novel electrode with a narrow slit and succeeded in generation of a narrow groove less than 0.1 mm.

由于气体分子的平均自由程小，在大气压条件下，可以在电极周围局部产生等离子体。然而，由于针状电极或非常细的线电极的热限制，用于高速率蚀刻的小等离子体的产生，特别是小于1mm的小等离子体的产生非常困难。因此，我们提出了一种具有窄缝的新型电极，并成功地产生了小于0.1 mm的窄槽。