Synthesis of m-scale giant fullerene particle

m级巨型富勒烯粒子的合成

• 批准号: 23656116
• 负责人: KATO Takahisa
• 金额: $ 2.58万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Exploratory Research
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 无数据
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23656116/
• 关键词: プラズマイオン注入; フラーレン; カーボンオニオン; 結晶成長; 粒子合成

Nano-structured fullerene materials such as C_<60> or carbon onion have been expected to have unique mechanical and electrical properties. However the practical applications of these nano-structured materials were not realized because of the size control limitations of the particle. In this research, it has been investigated to control and increase the particle size of these fullerene based materials using ion implantation technique. It was found that the vacuum annealing treatment of the Ag after the C ion implantation leads to increase the particle size of carbon onion formed in the Ag. This finding would be the key phenomena to synthesize large size fullerene nanoparticle for future applications.

纳米结构的富勒烯材料，如C&lt；60&gt；或碳洋葱，被认为具有独特的机械和电学性能。然而，由于颗粒的尺寸控制限制，这些纳米结构材料的实际应用还没有实现。在本研究中，利用离子注入技术来控制和增大这些富勒烯基材料的颗粒尺寸。结果表明，C离子注入后的Ag经真空退火热处理后，Ag中生成的碳洋葱颗粒尺寸增大。这一发现将是未来合成大尺寸富勒烯纳米粒子的关键现象。

项目成果

プラズマイオン注入を用いたカーボンオニオンの合成

使用等离子体离子注入合成碳洋葱

• 发表时间: 2011
• 作者: 松本直浩;崔俊豪;加藤孝久
• 通讯作者: 加藤孝久

Carbon onion growth induced by low-energy CH_4 plasma ion implantation into silver thin film

低能CH_4等离子体离子注入银薄膜诱导碳洋葱生长

• 发表时间: 2011
• 作者: N. Matsumoto;J. Choi;T. Kato;松本直浩
• 通讯作者: 松本直浩

Carbon onion growth induced by low-energy CH^4 plasma ion implantation into silver thin film

低能CH^4等离子体离子注入银薄膜诱导碳洋葱生长

• 发表时间: 2011
• 作者: N. Matsumoto;J. Choi;T. Kato
• 通讯作者: T. Kato

Carbon Onion film and its tribological applications

碳洋葱膜及其摩擦学应用

• 发表时间: 2012
• 作者: N. Matsumoto;J. Choi and T. Kato
• 通讯作者: J. Choi and T. Kato

Fabrication of Large-area Nanoparticle Assembled Film of Carbon Onions Synthesized by Plasma-based Ion Implantation

等离子体离子注入合成洋葱碳大面积纳米颗粒组装膜的制备

• 发表时间: 2011
• 作者: N. Matsumoto;J. Choi and T. Kato
• 通讯作者: J. Choi and T. Kato