A development of novel decomposition technology for NDMA by short wavelength UV lamp

短波长紫外灯分解NDMA新技术的开发

• 批准号: 23760500
• 负责人: SAKAI Hiroshi
• 金额: $ 2.83万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2012
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23760500/
• 关键词: 紫外線水処理; 国際情報交流

In this study, we picked up NDMA as a new disinfection by-product. We examined the efficiency of ultraviolet treatment as the treatment method. The potential benefit of ultraviolet radiation of shorter wavelength than traditional was revelaed. I examined the lamp of 222nm shorter than 254nm conventional lamp. We investigated the effect of dissolved matters on the decomposition efficiency of NDMA by 222nm lamp. We obtained a result which lamp is more suitable for the degradation, depending on water conditions. Further, it was found that using the novel fluorescent excimer lamp to output a 220-254nm, NDMA was decomposed efficiently while suppressing the formation of nitrite as a by-products.

在本研究中，我们将NDMA作为一种新的消毒副产物。我们考察了紫外线治疗作为治疗方法的有效性。比传统的波长更短的紫外线辐射的潜在好处被揭示出来。我测试了222 nm的灯，比常规的灯短了254 nm。在222 nm光源下，考察了溶解物质对NDMA分解效率的影响。根据不同的水条件，我们得出了哪种灯更适合降解的结果。进一步研究发现，利用这种新型的准分子荧光灯输出220-254 nm的波长，NDMA被有效地分解，同时抑制了亚硝酸盐的生成。

项目成果

共存物質がN-ニトロソジメチルアミンの紫外線分解と塩素添加による再生成に与える影響

共存物质对N-亚硝基二甲胺紫外分解及加氯再生的影响

• 发表时间: 2012
• 作者: 高松達朗;酒井宏治;小熊久美子;小坂浩司;浅見真理;滝沢智
• 通讯作者: 滝沢智

Degradation of N-Nitrosodimethylamine (NDMA) by 222 nm and 254 nm UV light

222 nm 和 254 nm 紫外光降解 N-亚硝基二甲胺 (NDMA)

• 发表时间: 2011
• 作者: Hiroshi SAKAI;Tatsuro TAKAMATSU;Koji KOSAKA;Naoyuki KAMIKO;Satoshi TAKIZAWA
• 通讯作者: Satoshi TAKIZAWA

Effects of Natural Organic Matter and Nitrate on the Behavior of NDMA during UV Irradiation and Chloramination

天然有机物和硝酸盐对 NDMA 在紫外线照射和氯胺化过程中行为的影响

• 发表时间: 2014
• 期刊: Journal of Water Supply : Research and Technology - Aqua
• 作者: Hiroshi Sakai;Tatsuro Takamatsu;Kumiko Oguma;Michio Murakami;Koji Kosaka;Mari Asami;and Satoshi Takizawa
• 通讯作者: and Satoshi Takizawa

紫外線処理過程におけるNDMA生成能の変化

紫外线处理过程中NDMA生成能力的变化

• 发表时间: 2012
• 作者: 酒井宏治;高松達朗;小熊久美子;村上道夫;小坂浩司;浅見真理;滝沢智
• 通讯作者: 滝沢智

Change in Haloacetic Acid Formation Potential during UV and UV/H2O2 Treatment of Model Organic Compounds

模型有机化合物在 UV 和 UV/H2O2 处理过程中卤乙酸形成电位的变化

• 发表时间: 2019
• 作者: Hiroshi Sakai;Olivier Autin;Simon Parsons
• 通讯作者: Simon Parsons