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A development of novel decomposition technology for NDMA by short wavelength UV lamp

A development of novel decomposition technology for NDMA by short wavelength UV lamp
短波长紫外灯分解NDMA新技术的开发
批准号：
23760500
负责人：
SAKAI Hiroshi
金额：
$2.83万
依托单位：
The University of Tokyo
依托单位国家：
日本
项目类别：
Grant-in-Aid for Young Scientists (B)
财政年份：
2011
资助国家：
日本
项目状态：
已结题
起止时间：
2011 至 2012
来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23760500/
关键词：
紫外線水処理国際情報交流

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英文摘要
In this study, we picked up NDMA as a new disinfection by-product. We examined the efficiency of ultraviolet treatment as the treatment method. The potential benefit of ultraviolet radiation of shorter wavelength than traditional was revelaed. I examined the lamp of 222nm shorter than 254nm conventional lamp. We investigated the effect of dissolved matters on the decomposition efficiency of NDMA by 222nm lamp. We obtained a result which lamp is more suitable for the degradation, depending on water conditions. Further, it was found that using the novel fluorescent excimer lamp to output a 220-254nm, NDMA was decomposed efficiently while suppressing the formation of nitrite as a by-products.
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会议论文
共存物質がN-ニトロソジメチルアミンの紫外線分解と塩素添加による再生成に与える影響
共存物质对N-亚硝基二甲胺紫外分解及加氯再生的影响
DOI： --
发表时间： 2012
期刊：
影响因子： --
作者： [高松達朗, 酒井宏治, 小熊久美子, 小坂浩司, 浅見真理, 滝沢智]
通讯作者： 滝沢智
Degradation of N-Nitrosodimethylamine (NDMA) by 222 nm and 254 nm UV light
222 nm 和 254 nm 紫外光降解 N-亚硝基二甲胺 (NDMA)
DOI： --
发表时间： 2011
期刊：
影响因子： --
作者： [Hiroshi SAKAI, Tatsuro TAKAMATSU, Koji KOSAKA, Naoyuki KAMIKO, Satoshi TAKIZAWA]
通讯作者： Satoshi TAKIZAWA
Effects of Natural Organic Matter and Nitrate on the Behavior of NDMA during UV Irradiation and Chloramination
天然有机物和硝酸盐对 NDMA 在紫外线照射和氯胺化过程中行为的影响
DOI： --
发表时间： 2014
期刊： Journal of Water Supply : Research and Technology - Aqua
影响因子： --
作者： [Hiroshi Sakai, Tatsuro Takamatsu, Kumiko Oguma, Michio Murakami, Koji Kosaka, Mari Asami, and Satoshi Takizawa]
通讯作者： and Satoshi Takizawa
Change in Haloacetic Acid Formation Potential during UV and UV/H2O2 Treatment of Model Organic Compounds
模型有机化合物在 UV 和 UV/H2O2 处理过程中卤乙酸形成电位的变化
DOI： --
发表时间： 2019
期刊：
影响因子： --
作者： [Hiroshi Sakai, Olivier Autin, Simon Parsons]
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  • 资助金额：
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  • 资助金额：
    $3.0万
  • 财政年份：
    2014
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  • 批准号：
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  • 项目类别：
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  • 资助金额：
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  • 财政年份：
    2013
  • 负责人：
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  • 依托单位：
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