Novel etching process for graphene fabrication utilizing oxidation decomposition reaction

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We show that graphene layers can be removed from graphite in a layer by layer manner using reactive oxygen species generated by plasma. However, Raman spectrum suggests that the surface of a fabricated graphene sheet by the etching is oxidized. Careful inspection of the oxidation decomposition process clarifies that oxidation occur only at the top most surface. These results indicate a possibility to establish a procedure that makes it possible to etch graphene layers from graphite with controlling the number of the layers. Our next step is to find a way to remove the top most oxidized graphene layer.