Study on GaN-based blue vertical cavity surface emitting laser on Si
Study on GaN-based blue vertical cavity surface emitting laser on Si
批准号:
09650049
负责人:
EGAWA Takashi
金额:
$2.18万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999
中文摘要
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英文摘要
GaN, AlN and their alloys have direct transition type band gap structure and have attracted much attention for optical devices in the blue-ultraviolet region. GaN-based edge emitting lasers have been extensively studies and have achieved room temperature continuous wave operation. Recently, GaN-based vertical cavity surface emitting lasers (VCSELs) with a distributed Bragg reflector (DBR) have attracted much interest for various optical applications due to the fabrication of a smooth mirror without a cleavage technique. The DBR is also effective in improving the output power of LED. Thus, the DBR plays an important rule to fabricate high performance optical devices such as LED and VCSEL. In this study, the use of the GaN/AlィイD20.27ィエD2GィイD20.73ィエD2 DBR as a bottom mirror has improved the characteristics of InGaN MQW LED sapphire. Moreover, the reflectivity as high as 98% has been obtained by the use of the strained layer superlattice (SLS) beneath the DBR structure. The InGaN MQW LED grown on the 15 pairs of DBR with a reflectivity of 75% was fabricated for the first time to the best of our knowledge. The output power of 120μW at 435 nm was about 1.5 times as large as that of the conventional LED. The DBR is very promising for the fabrication of high performance GaN-based LED and VCSEL.
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G.Y.Zhao et al.: "Energy-gap narrowing in a current injected InGaN/AlGaN surface light emitting diode" Appl. Phys. Lett.71・17. 2424-2426 (1997)
G.Y.Zhao 等:“电流注入 InGaN/AlGaN 表面发光二极管中的能隙变窄”Appl.71・17(1997)。
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H. Ishikawa et al.: "GaN on Si Substrate with AlGaN/AlN Intermediate Layer"Jpn. J. Appl. Phys.. Vol. 38 No. 2. L492-L494 (1999)
H. Ishikawa 等人:“具有 AlGaN/AlN 中间层的 Si 衬底上的 GaN”Jpn。
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T. Egawa et al.: "Characteristics of a GaN Metal Semiconductor Fiel-Effect Transistor Grown on a Sapphire Substrate by Metalorganic Chemical Vapor Deposition"Jpn. J. Appl. Phys.. Vol. 38, No. 4B. 2630-2633 (1999)
T. Ekawa 等人:“通过金属有机化学气相沉积在蓝宝石衬底上生长的 GaN 金属半导体场效应晶体管的特性”Jpn。
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T. Egawa: "Characteristics of a GaN Metal Semiconductor Field-Effect Transistor Grown on a Sapphire Substrate by Metalorganic Chemical Vapor Deposition"Jpn. J. Appl. Phys.. 38,4B. 2630-2633 (1999)
T. Ekawa:“通过金属有机化学气相沉积在蓝宝石衬底上生长的 GaN 金属半导体场效应晶体管的特性”Jpn。
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T.Egawa et al.: "Investigations of SiO_2/n-GaN and SiN_4/n-GaN insulator-semiconductor interfaces with low interface state density" Appl.Phys.Lett.73・6. 809-811 (1998)
T.Ekawa等人:“具有低界面态密度的SiO_2/n-GaN和SiN_4/n-GaN绝缘体-半导体界面的研究”Appl.Phys.Lett.73・6(1998)。
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共 22 条
Combination of physical assessment models using an e-learning in PBL
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Study on quaternary GaN-based optoelectronic devices on large diameter Si substrate
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负责人:EGAWA Takashi
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