Study on new stereo-lithography system with excimer laser

新型准分子激光立体光刻系统研究

• 批准号: 09555218
• 负责人: SATOH Saburoh
• 金额: $ 7.62万
• 依托单位: Saga University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09555218/
• 关键词: laser stereo-lithography; excimer laser; reduction of operating time; beam homogenizer; ultraviolet light solidify resin; low cost type stereo-lithography; XeCl excimer lamp; N2 laser; 紫外線ファイバー; エキシマランプ; 硬化歪み; ビーム強度の均一化; 光硬化; 樹脂硬化量; 3次元造形物

In this study, we investigated a new type of laser stereo-lithography system with XeCl Excimer laser which wavelength was 308nm. In conventional systems, continuous wave Ar ion (351nm/364nm) and He-Cd (325nm) lasers were used as an ultraviolet (UV) light source, which functioned a small point pattern maker of 0.2mm in diameter. On the other hand, a new system proposed us with excimer laser could dramatically reduce the manufacturing time, because laser output power was high enough and beam size was bigger (10mm x 20mm) compare than the conventional ones. Therefore we also investigated a new technique, how to use the big size and high power excimer laser beam efficiently. Moreover we studied an excimer lamp for a low-cost UV light source.For the laser stereo-lithography, XeCl excimer laser was adapted to improve the utilization efficiency of laser energy. Because of the beam uniformity was made better with a homogenizer, the quantity of hardened resin per laser energy was increased compare than that of without a homogenizer. With this method a simple 3D object was created, and it was proved that XeCl excimer laser was possible to apply for the stereo-lithography.On the other hand, because of its excellent output efficiency, XeCl excimer lamp and N2 laser were one of a candidate of lower-cost stereo-lithography equipment, which allowed down sizing of the power supply and lamp head, and air-cooling. In view of this, attempts were made to develop special design cylindrical tubes with optical fiber system as the UV light source. Consequently, fiber transmission efficiency of excimer lamp was too low because of its high beam divergence. But the N2 laser was good enough to apply for the lower-cost stereo-lithography system.

在本研究中，我们利用波长为308 nm的XeCl准分子激光器，研究了一种新型激光立体光刻系统。在常规系统中，使用连续波Ar离子(351 nm/364 nm)和He-Cd(325 Nm)激光器作为紫外光(UV)光源，其功能是直径0.2 mm的小点成图器。另一方面，我们提出的一种新的准分子激光系统可以极大地缩短制造时间，因为与传统的系统相比，激光输出功率足够大，光束尺寸更大(10 mm×20 mm)。因此，我们还研究了一种新的技术，如何高效地利用大尺寸、高功率的准分子激光。此外，我们还研究了一种用于低成本紫外光光源的准分子灯。对于激光立体光刻，采用了XeCl准分子激光器来提高激光能量的利用效率。由于均质器使光束的均匀性更好，与未均质器相比，每激光能量的硬化树脂数量增加。用该方法制作了一个简单的三维物体，证明了XeCl准分子激光应用于立体光刻的可能性；另一方面，XeCl准分子灯和氮气激光器由于其优异的输出效率，成为低成本立体光刻设备的候选之一，可以减小电源和灯头的尺寸，并允许空气冷却。有鉴于此，人们尝试开发以光纤系统为紫外光光源的特殊设计的圆柱管。因此，准分子灯的光纤传输效率太低，因为它的光束发散角太大。但氮气激光器足够好，可以应用于成本较低的立体光刻系统。

项目成果

佐藤三郎,山部長兵衛他: "XeClエキシマレーザ/ランプを用いた光造形装置の検討" レーザー学会学術講演会第19回年次大会. 29aVI2. 93 (1999)

Saburo Sato、Chobei Yama 等人：“使用 XeCl 准分子激光/灯的立体光刻设备的研究”第 19 届日本激光学会年会 29aVI2（1999）。

K.Yokagawa, S.Satoh, C.Yamabe et al.: "A study on mask type stereo-lithography with XeCl excimer laser (in Japanese)"Reports on Topical Meeting of The Laser Society of Japan. No. RTM-97-46. 39-43 (1997)

K.Yokakawa、S.Satoh、C.Yamabe 等人：“利用 XeCl 准分子激光进行掩模型立体光刻的研究（日语）”日本激光学会专题会议报告。

佐藤 三郎: "エキシマレーザを用いた光造形の研究" 産官学技術交流会 in北九州 予稿. 18 (1997)

佐藤三郎：“准分子激光立体光刻技术的研究”北九州产官学技术交流会初稿18（1997）。

S.Satoh, C.Yamabe et al.: "Excimer Lamp Stereo-Lithpgraphy"Proceedings of SPIE - Laser Applications on Microelectronic and Optoelectronic Manufacturing V. Vol. 3933. 1-8 (2000)

S.Satoh、C.Yamabe 等人：“准分子灯立体光刻”SPIE 论文集 - 激光在微电子和光电制造中的应用 V. Vol。

S.Satoh, C.Yamabe et al.: "Stereo-Lithography with XeCl Excimer Lamp"Proceedings of the 8th International Conference on Rapid Prototyping. (in press). (2000)

S.Satoh、C.Yamabe 等人：“使用 XeCl 准分子灯进行立体光刻”第八届国际快速原型会议论文集。