Three-dimensional analysis of advanced industrial material using nano ion beam

使用纳米离子束对先进工业材料进行三维分析

• 批准号: 09450308
• 负责人: OWARI Masanori
• 金额: $ 7.81万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09450308/
• 关键词: focused ion beam; secondary ion mass spectrometry; Auger electron spectroscopy; three-dimensional analysis; elemental mapping; time-of-flight mass spectrometry; 二次元イオン質量分析; マッピング; パルス; シミュレーション; オージェ電子; イオン励起; 飛行時間型; 微小部分析

The purpose of this project was to establish the new method for three-dimensional microanalysis of advanced industrial material, by utilizing micromachining and analytical capability of the focused ion beam. Combinations of a gallium focused ion beam and a focused electron beam together with an electron energy analyzer, and of a pulsed gallium focused ion beam and a time-of-flight, mass spectrometer were constructed.Three-dimensional Auger microanalyzer was realized by the first combination. Lateral resolution was limited to about 1 micrometer by the beam diameter of rather old type electron gun. In depth resolution was, in principle, about 5 nanometer which is limited by steering precision and profile of the focused ion beam. High quality three-dimensional elemental maps of elements with concentration of 10 to 20% were obtained from a semiconductor device.About 200 nanometer resolution was realized with the time-of-flight, secondary ion mass spectrometry mapping. A wire bonding part of a semiconductor device was analyzed. Three-dimensional maps of silicon and aluminum were clearly displayed.

本计画的目的是利用聚焦离子束的微加工与分析能力，建立先进工业材料的三维微分析新方法。将镓聚焦离子束和聚焦电子束与电子能量分析仪、脉冲镓聚焦离子束与飞行时间质谱仪组合，实现了三维俄歇微分析仪。由于电子枪的电子束直径较老，横向分辨率仅限于1微米左右。深度分辨率原则上约为5纳米，这受到聚焦离子束的操纵精度和轮廓的限制。在半导体器件上获得了浓度为10 ~ 20%的元素的高质量三维元素图，飞行时间二次离子质谱图的分辨率达到200 nm左右。对半导体器件的引线键合部分进行了分析。硅和铝的三维图谱清晰显示。

项目成果

T. Sakomoto: "Three-Dimensioned Microanalysis of Suid Matherial ssing Ion and Electron Dual Focused"J, Surt, Anal.. 5. 150-153 (1999)

T. Sakomoto：“离子和电子双聚焦液体物质的三维微分析”J，Surt，Anal.. 5. 150-153 (1999)

T.Sakamoto: "Development of an ion and electron and focused beam apparatus for three-dimensignal microanalysis" Jpn.J.Appl.Phys.37. 2051-2056 (1998)

T.Sakamoto：“用于三维信号微分析的离子、电子和聚焦束装置的开发”Jpn.J.Appl.Phys.37。

坂本哲夫: "イオン・電子デュアル収束ビームを用いる三次元局所分析法の開発"分析化学. 47. 313-317 (1998)

Tetsuo Sakamoto：“使用双聚焦离子束和电子束的三维局部分析方法的开发”分析化学 47. 313-317 (1998)。

Z. Cheng et al.: "Microarea analysis using Auger electrons induced by gallium focused ion beam"J. Surf. Anal.. 5. 181-184 (1999)

Z. Cheng 等：“使用镓聚焦离子束诱导的俄歇电子进行微区域分析”J。

M. Owari et al.: "Compositions of Cross Sections Created with a Gallium Focused Ion Beam"J. Surf. Anal.. 5. 356-359 (1999)

M. Owari 等人：“用镓聚焦离子束创建的横截面的组合”J。