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Fabrication of single crystalline bulk GaN substrates using GaAs as seed crystals

Fabrication of single crystalline bulk GaN substrates using GaAs as seed crystals
使用 GaAs 作为晶种制造单晶体 GaN 衬底
批准号:
09450121
负责人:
HASEGAWA Fumio
金额:
$5.44万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999

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中文摘要
翻译
半导体β-FeSi_2作为一种在Si衬底上制备光电器件的新型材料,受到了广泛的关注。本工作的目的是在Si(001)衬底上获得高质量的β-FeSi_2薄膜,并在此基础上制备可用作光互连光源的发光二极管。本项目取得的主要成果如下:1.以外延生长的β-FeSi_2为模板和SiO_2覆盖层,在Si(001)衬底上沉积纳米Si/Fe多层膜,经退火处理后得到了高质量的β-FeSi_2薄膜。SiO_2覆盖层阻止了β-FeSi_2的热团聚。β-FeSi_2薄膜的导电类型由沉积的β-FeSi_2的Si/Fe比控制。p型和n型p-FeSi_2薄膜的最大电子和空穴迁移率分别为6900 cm ^2/ Vs和13000 cm ^2/Vs。这是有史以来最高的价值。2.采用反应沉积外延法生长β-FeSi_2,并利用分子束外延(MBE)技术将其嵌入Si中,首次在Si p-n二极管中实现了1.6μm的室温电致发光。当注入电流密度大于10A/cm ^2时,在室温下观察到1.6μm的电致发光。这种电致发光的实现是由于在500℃的较低温度下,用合适的氧浓度较低的Si衬底将β-FeSi_2包埋在分子束外延硅中。
英文摘要
Semiconducting β-FeSi_2 has been attracting much attention as a promising material for opto-electronic devices on Si substrates. Purpose of this work is to obtaine high quality β-FeSi_2 films on Si (001) substrates and furthermore to fabricate light-emitting diodes which can be used as light sources in optical inter-connections. Achievements in this project are as follows.1. [100]-oriented high quality β-FeSi_2 films were obtained.The β-FeSi_2 films were fabricated by annealing nanometer-thick Si/Fe multilayers deposited on a Si (001) substrate using epitaxial β-FeSi_2 as a template and a SiO_2 capping layer. The SiO_2 capping layer prevented aggregation of β-FeSi_2 against heating. The conduction type of the β-FeSi_2 films was controlled by deposited Si/Fe ratios of the β-FeSi_2. The maximu electron and hole mobilitis were 6900cm^2/ Vs and 13000cm^2/Vs at about 50 K, for the p-type and n-type p-FeSi_2 films, respectively. These are the highest values ever reported.2. Room temperature 1.6μm electroluminescence was realized from a Si p-n diode with β-FeSi_2 active region for the first time.The β-FeSi_2 was grown by reactive deposition epitaxy, and embedded in Si by molecular beam epitaxy (MBE). The 1.6μm electroluminescence (EL) was observed at RT for injected current density above 10A/cm^2. Realization of this EL was attributed to embedding β-FeSi_2 by MBE-Si at relatively low temperature of 500℃, and using suitable Si substrates with small oxygen concentrations.
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会议论文
T.Suemasu: "Room Temperature 1.6μm Electroluminescence from a Si-Based Light Emitting Diode with β-FeSi_2 Active Region"Jpn.J.Appl.Phys.. Vol.39,No.10B. L1013-L1015 (2000)
T.Suemasu:“具有 β-FeSi_2 活性区的硅基发光二极管的室温 1.6μm 电致发光”Jpn.J.Appl.Phys.. Vol.39,No.10B (2000)。
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T.Suemasu: "Dependence of photoluminescence from β-FeSi_2 and induced deep levels in Si on the size of embedded β-FeSi_2 balls in Si"Thin Solid Films. Vol.381. 209-213 (2001)
T.Suemasu:“β-FeSi_2 的光致发光和 Si 中的诱导深能级对 Si 中嵌入的 β-FeSi_2 球的尺寸的依赖性”,第 381 卷(2001 年)。
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K.Takakura: "Control of the Conduction Type of Nondoped High Mobility β-FeSi_2 Films Grown from Si/Fe Multilayers by Change of Si/Fe Ratios"Jpn.J.Appl.Phys.. Vol.39,No.8A. L789-L791 (2000)
K.Takakura:“通过改变Si/Fe比率来控制由Si/Fe多层生长的非掺杂高迁移率β-FeSi_2薄膜的传导类型”Jpn.J.Appl.Phys.Vol.39,No.8A。 -L791 (2000)
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K.Takakura, T.Suemasu, N.Hiroi and F.Hasegawa: "Improvement of the Electrical Properties of β-FeSi_2 Films on Si (001) by High Temperature Annealing"Jpn.J.Appl.Phys.. Vol.39, No.3A/B. L233-L236 (2000)
K.Takakura、T.Suemasu、N.Hiroi 和 F.Hasekawa:“通过高温退火改善 Si (001) 上 β-FeSi_2 薄膜的电性能”Jpn.J.Appl.Phys.. Vol.39, No.3A/B。L233-L236 (2000)
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20
    Investigation of a solar battery using the environmentally friendly semiconductor : beta-FeSi_2
    • 批准号:
      12450137
    • 项目类别:
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    • 资助金额:
      $6.21万
    • 财政年份:
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    • 负责人:
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    • 依托单位:
    Fabrication of single crystalline bulk GaN substrates using GaAs as seed crystals
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    • 项目类别:
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    • 资助金额:
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    • 财政年份:
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    • 项目类别:
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    • 资助金额:
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