Novel microwave plasma sputter deposition process, enhanced durability coatings NMPLAS
Novel microwave plasma sputter deposition process, enhanced durability coatings NMPLAS
批准号:
103752
负责人:
金额:
$50.56万
依托单位:
依托单位国家:
英国
项目类别:
Collaborative R&D
财政年份:
2017
资助国家:
英国
项目状态:
已结题
起止时间:
2017 至 --
中文摘要
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英文摘要
The NMPLAS project is focused on an innovation in the Materials and Manufacturing high growth sector and will apply a cutting edge and innovative, high throughput coating process - Microwave Plasma Assisted Sputtering (MPAS), to produce infrared (IR) transparent and hard, wear/erosion resistant coatings, which are themselves an innovation in materials development. The coatings will be applied on an expanded range of thermally sensitive and strategic substrates, which will initially be exploited in the optical and automotive high value manufacturing sectors, thereby opening up new sustainable business for the partners and increasing the UK's competitiveness, in addition to the transfer of techology to the industrial partners in the project (enabling a step-change in capability for an SME) and opportunities for future growth in capital equipment sales. This business-led project brings together three industrial partners from these sectors, Teer Coatings Limited (TCL), Qioptiq Limited (QUK) and the SME Helia Photonics Ltd (HPL), with the University of the West of Scotland (UWS), who have pioneered the MPAS process.
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国内基金
海外基金
无线输电关键技术理论与实验研究
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批准号:60471033
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项目类别:面上项目
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资助金额:23.0万元
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批准年份:2004
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负责人:王秩雄
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依托单位:
大气下利用微波等离子体处理粮食的实验研究
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批准号:50477005
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项目类别:面上项目
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资助金额:25.0万元
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批准年份:2004
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负责人:张贵新
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依托单位:
非水相微波辐射-酶耦合催化(MIECC)的作用机制
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批准号:20476038
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项目类别:面上项目
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资助金额:22.0万元
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批准年份:2004
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负责人:方云
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依托单位: