Novel microwave plasma sputter deposition process providing enhanced optical coatings NMPLAS
Novel microwave plasma sputter deposition process providing enhanced optical coatings NMPLAS
批准号:
104007
负责人:
金额:
$49.32万
依托单位:
依托单位国家:
英国
项目类别:
Collaborative R&D
财政年份:
2018
资助国家:
英国
项目状态:
已结题
起止时间:
2018 至 --
中文摘要
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英文摘要
The NMPAS project is focused on an innovation in the Materials & Advanced Manufacturing high growth sector, applying a cutting edge & innovative coating process - Microwave Plasma Assisted Sputtering (MPAS). This offers a room temperature process with up to 6-fold increase in optical coating production throughput compared to current predominantly used high temperature electron-beam deposition production processes. Moreover, MPAS enables use of an expanded range of thermally sensitive/strategic substrates, providing cost and optical coating peformance benefits. Optical coatings are predominant among high value manufacturing sectors & this project opens up new sustainable business for the partners by increasing both the UK’s & China’s competitiveness in lucrative current & emerging high margin global markets. MPAS technology transfer from Univerity of the West of Scotland (UWS) to the project’s industrial partners will enable a step-change in capability for the SMEs. With circa 90% of the worlds optical coatings produced in China, exciting new opportunities for future growth in both capital equipment and coated component sales into the Chinese market. This business-led project brings together three industrial partners from the optical coating sector, UK SMEs Helia Photonics Limited (HPL) & Orion Photonics Ltd (OPL) & Shanghai-based Jason Vacuum Co.,Ltd (SJV), with UK academic partner UWS, pioneer of the MPAS process. The project advances the Technology Readiness Level (TRL) of MPAS to a late stage pre-commercial level, i.e. >TRL6.
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国内基金
海外基金
无线输电关键技术理论与实验研究
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批准号:60471033
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项目类别:面上项目
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资助金额:23.0万元
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批准年份:2004
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负责人:王秩雄
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依托单位:
大气下利用微波等离子体处理粮食的实验研究
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批准号:50477005
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项目类别:面上项目
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资助金额:25.0万元
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批准年份:2004
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负责人:张贵新
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依托单位:
非水相微波辐射-酶耦合催化(MIECC)的作用机制
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批准号:20476038
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项目类别:面上项目
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资助金额:22.0万元
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批准年份:2004
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负责人:方云
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依托单位: