Metrology concepts for a new generation of plasma manufacturing with atom-scale precision

具有原子级精度的新一代等离子体制造的计量概念

• 批准号: EP/K018388/1
• 负责人: Timo Gans
• 金额: $ 252.26万
• 依托单位: University of York
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2013
• 资助国家: 英国
• 起止时间: 2013 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FK018388%2F1
• 关键词: Metrology; concepts; new; generation; plasma

This research proposal is targeted at addressing the challenge of real-time metrology for control of flexible and reconfigurable technological plasma systems. Plasma technologies not only underpin many high-end multi-billion pound manufacturing industries of today, but also are critical elements for the invention of new devices of the future. A new revolution is underway in plasma processing; the 'ivy-bridge' 3-dimensional atomic layer nano-structures of Intel Corp. and new carbon-based supermaterials of Element Six have only just been realised. This opens up new horizons for inventions.Envisaged applications of next-generation plasma processing include manipulation of edge-bonds of single-layer graphene, low power biologically implanted chips as sensors or neuro-motive devices, innovative chemistry applications for biofuel synthesis and realisation of micro-batteries, flexible micro-electronics, fabrication of micro-electromechanical devices, as well as directly using plasmas for medicine, surgery and pharmacy.Realisation of all these critically depends on the development of new adaptable plasma processing techniques. As the industry transforms itself this is an exciting time. One critical bottleneck is the lack of adaptable process control. We propose a novel non-invasive sensor and virtual metrology concept to monitor substrate relevant parameters to enable real-time plasma tuning. This has developed from our pioneering research on the topic and recent discoveries.Our innovative sensor - pulse induced optical emission spectroscopy (PiOES) is analogous to laser induced fluorescence spectroscopy and will instead of a laser utilise a non-intrusive low voltage rapid nanosecond electronic pulse to generate similar excitation conditions in the plasma. Electron impact excitation will create transient excited states and through the subsequent optical fluorescence, and associated temporal fingerprint, distinct atoms and molecules can be identified. The power and sensitivity of the technique originates from exploiting both the energy dynamics as well as the population dynamics in the nonlinear plasma-surface interface (sheath) region. This will allow detection down to atomic layer defects within micron locality.The aim of our research programme is to develop and demonstrate our metrology technique in three extreme working environments: low pressure anisotropic plasma etching, synthetic diamond manufacturing, and atmospheric plasmas for medicine and pharmacy. We will demonstrate this metrology technique in full fabrication reactors and environments. This project is a collaboration between world-leaders in the field: The University of York, The University of Bristol, Intel Corp., Element Six, Andor Technology, Quantemol, Smith and Nephew, Hiden Analytical and Oxford Instruments. An advisory board, including leading members from a diverse range of companies and academia, has been installed to ensure industrial relevance and uptake as the project progresses.

该研究提案旨在解决控制灵活和可重构技术等离子体系统的实时计量挑战。等离子体技术不仅支撑着当今许多价值数十亿英镑的高端制造业，而且是未来新设备发明的关键要素。等离子体处理领域正在掀起一场新的革命；英特尔公司的“常春藤桥”3维原子层纳米结构和元素六的新型碳基超级材料才刚刚实现。这为发明开辟了新的视野。下一代等离子体处理的设想应用包括单层石墨烯边缘粘合的操纵、作为传感器或神经动力装置的低功率生物植入芯片、生物燃料合成的创新化学应用和微型电池的实现、柔性微电子、微机电装置的制造等 直接将等离子体用于医学、外科和制药。所有这些的实现关键取决于新的适应性等离子体处理技术的开发。随着行业的自身转型，这是一个激动人心的时刻。一个关键瓶颈是缺乏适应性强的过程控制。我们提出了一种新颖的非侵入式传感器和虚拟计量概念来监测基板相关参数以实现实时等离子体调谐。这是我们在该主题上的开创性研究和最近的发现发展而来的。我们的创新传感器 - 脉冲诱导光发射光谱 (PiOES) 类似于激光诱导荧光光谱，将利用非侵入式低压快速纳秒电子脉冲代替激光在等离子体中产生类似的激发条件。电子碰撞激发将产生瞬态激发态，并通过随后的光学荧光和相关的时间指纹，可以识别不同的原子和分子。该技术的功率和灵敏度源于对非线性等离子体表面界面（鞘）区域中的能量动力学和总体动力学的利用。这将允许检测到微米范围内的原子层缺陷。我们研究计划的目的是在三种极端工作环境中开发和演示我们的计量技术：低压各向异性等离子体蚀刻、合成金刚石制造以及用于医学和制药的大气等离子体。我们将在全制造反应器和环境中演示这种计量技术。该项目是该领域世界领先者之间的合作：约克大学、布里斯托大学、英特尔公司、Element Six、Andor Technology、Quantemol、Smith and Nephew、Hiden Analytical 和 Oxford Instruments。已经成立了一个咨询委员会，其中包括来自不同公司和学术界的领导成员，以确保项目进展过程中的行业相关性和吸收。

项目成果

Diamond chemical vapor deposition using a zero-total gas flow environment

• DOI: 10.1016/j.diamond.2020.108011
• 发表时间: 2020-07
• 期刊: Diamond and Related Materials
• 影响因子: 4.1
• 作者: Alex Croot;E. Mahoney;H. Dominguez-Andrade;M. Ashfold;N. Fox

Controlled production of atomic oxygen and nitrogen in a pulsed radio-frequency atmospheric-pressure plasma

• DOI: 10.1088/1361-6463/aa8da2
• 发表时间: 2017-11-15
• 期刊: JOURNAL OF PHYSICS D-APPLIED PHYSICS
• 影响因子: 3.4
• 作者: Dedrick, J.;Schroter, S.;Gans, T.
• 通讯作者: Gans, T.

Nanosecond optical imaging spectroscopy of an electrothermal radiofrequency plasma thruster plume

电热射频等离子体推进器羽流的纳秒光学成像光谱

• DOI: 10.1063/1.4821738
• 发表时间: 2013
• 期刊: Applied Physics Letters
• 影响因子: 4
• 作者: Charles C