课题基金 / 基金详情

Towards deterministic atomic scale manufacturing of next-generation quantum devices

Towards deterministic atomic scale manufacturing of next-generation quantum devices
迈向下一代量子器件的确定性原子尺度制造
批准号:
EP/X021963/1
负责人:
Wenkun Xie
金额:
$26.0万
依托单位:
依托单位国家:
英国
项目类别:
Fellowship
财政年份:
2023
资助国家:
英国
项目状态:
未结题
起止时间:
2023 至 --

项目摘要

项目成果

相似基金

相关文献

中文摘要
翻译
点击翻译按钮获取中文摘要
英文摘要
The new round of quantum technology (QT) revolution has started worldwide. In the global race to unlock the potential of QTs and bring transformative advances to science, industry, and society, Europe must build a solid manufacturing base to meet the increasing manufacturing demands for next-generation quantum devices. Superconducting nanowire single-photon detectors (SNSPDs) are core elements of photonic integrated circuits to control photonic quantum states for QT applications. Due to high process variability, the current manufacturing technology fails to meet the extreme demands of SNSPDs for uniform material properties of superconducting materials. This project aims at researching and developing a new mechanical approach to enable the deterministic, atomic-scale manufacturing of superconducting nanowires (NWs). This new work will upgrade the EU's manufacturing capabilities of photonic integrated circuits, enabling Europe to lead the new round of the global QT revolution.The fellow is currently an emerging leader at the forefront of international advances in the research and development of Atomic and Close-to-atomic Scale technology. With support from internationally leading expertise (i.e. Focused ion beam(FIB) nanomanufacturing, Precision Manufacturing, and Quantum Technology) in the hosting institution, a timely award of this prestigious fellowship will provide the fellow with the necessary resources and access to expertise to make rapid progress in this emerging research area and become an internationally leading independent researcher in Europe ready to compete globally. An industrial partner will be granted a license by the University of Strathclyde to take the new technology to market within three years of the research programme's completion, addressing a market with an estimated value of over 300 million Euros.
期刊论文(1)
专著(0)
科研奖励(0)
会议论文
Atomistic insights into bias-induced oxidation on passivated silicon surface through ReaxFF MD simulation
通过 ReaxFF MD 模拟对钝化硅表面偏压诱导氧化的原子洞察
DOI: 10.1016/j.apsusc.2023.157253
发表时间: 2023
期刊: Applied Surface Science
影响因子: 6.7
作者: [Gao J]
通讯作者: Gao J
海外基金