Development on nano-imprint lithography stamps using DRIE PVD tungsten films

纳米压印光刻（NIL）是一种非传统的光刻技术，用于以高精度和低成本高通量地图案化聚合物纳米结构。与传统的基于光和电子的光刻不同，不使用透射掩模。相反，形成压印抗蚀剂层以在抗蚀剂中形成结构的印模。NIL有望生产具有竞争力的尺寸结构（低于50 nm），但拥有成本大大降低。然而，NIL的一个缺点是戳的生命周期（称为模板）。该项目将着眼于钨基模板的形成，该模板有望增加使用寿命，并具有可比的高分辨率结构。作者在硅衬底上沉积的钨膜结构的形成方面获得了重要的专业知识。该项目将允许作者探索钨作为NIL模板的适用性。将探索最终的结构尺寸，目标是小于50 nm的最小特征尺寸。将制作一个实验室演示器，并在一个NIL工具上进行练习，以形成测试模式。

Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high-throughput patterning of polymer nanostructures at great precision and at low costs. Unlike conventional photo and electron based lithography a transmission mask is not used. Instead a stamp is formed that embosses a resist layer to form the structure in the resist. NIL has the promise of producing competitively sized structures, (sub-50 nm), but at substantially reduced cost of ownership. One of the draw backs of NIL, however, is the lifetime of the stamp (known as a template). The project will look at the formation of a tungsten based template which has the promise of increase useful life with comparable high-resolution structures.The authors have gained significant expertise in the formation of structures in tungsten films deposited on silicon substrates. The project will allow the authors to explore the suitability of tungsten as an NIL template. The ultimate structure size will be explored, with a target of less than 50 nm minimum feature size. A laboratory demonstrator will be produced and exercised on an NIL tool to form test patterns.