Solution based CVD Approach to Metal Sulfide Thin Films

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In this project we will develop sustainable routes to thin film metal sulfide materials from novel precursors with equivalent or better figures of merit to existing materials. The films will be developed using a solution based chemical vapour deposition process known as aerosol assisted chemical vapour deposition (AACVD). In AACVD, precursors are transported in the aerosol and the key requirement is for the precursor to be soluble, overcoming the volatility issues with traditional CVD processes. This expands the range of precursors that can be used and the deposition of ternary/quaternary materials can be achieved by using a precursor mix in the aerosol. The rapid processing and simplicity of the AACVD equipment means that modifications to the process at an industrial scale are achievable at low cost, and the process could function in continuous production. This would produce highly functional thin films with no need for further batch post-deposition treatment.