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Advanced Gate Driving for Wide Bandgap Devices - 1=Energy 2=Microelectronic device technology

Advanced Gate Driving for Wide Bandgap Devices - 1=Energy 2=Microelectronic device technology
宽带隙器件的先进栅极驱动 - 1=能源 2=微电子器件技术
批准号:
2206335
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2019
资助国家:
英国
项目状态:
已结题
起止时间:
2019 至 --

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中文摘要
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英文摘要
Silicon carbide (SiC) unipolar devices like MOSFETs and Schottky diodes are projected to be the semiconductors of choice for future converters. Self-commutating voltage source converters (VSCs) based on unipolar SiC devices promise to revolutionize grid-connected power electronics by shrinking the size of converters, the passive components, improving the efficiency of energy conversion and simplifying cooling systems. The reliability of the this new material in a silicon dominated industry remains relatively unknown and if confidence is to be established in SiC, accurate physics-based reliability prediction and design tools are required for devices and converters. Also, more advanced gate drivers and condition monitoring systems are needed to fully expedite the advantages of silicon carbide. Fast switching devices in the presence of parasitic inductances will be subjected to considerable electrothermal and electromagnetic stresses. Power electronic modules are comprised of materials with different coefficients of thermal expansion hence, crack growth and propagation at critical interfaces occurs as a result of repeated electrical switching. This mechanical damage/fatigue alters the electrothermal performance of the device. Thermal runaway due to electro-thermo-mechanical stresses is a significant threat to the long term reliability of energy dense SiC devices especially since advances in packaging technologies are lagging in comparison to device technology. The purpose of this PhD is to design and develop new gate driving and condition monitoring systems for improving the operation of SiC power devices.
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面向无人机应用的增强型p-gate AlGaN/GaN HEMT高功率微波辐射效应及 机理研究
二次外延势垒层的新型p-gate GaN HEMT器件栅极可靠性研究
直接带隙In2Se3、GaTe纳米片/MoS2复合薄膜的制备及饱和吸收性能的研究
  • 批准号:
    2020A151501861
  • 项目类别:
    省市级项目
  • 资助金额:
    10.0万元
  • 批准年份:
    2020
  • 负责人:
    龙慧
  • 依托单位:
二次外延AlGaN势垒层的增强型p-gate GaN HEMT新结构研究