Development of optical spin-resonance methods with advanced light sources

半导体和绝缘体的光学和电子性质强烈依赖于其中所含缺陷的存在，它们的研究对新型光电材料的发展具有深远的影响。电子自旋共振（ESR）测量在确定缺陷的电子和结构性质方面特别有价值，但是ESR实验中光激发/检测能力的耦合提供了极其有价值的额外信息。在这方面采用了两种传统的通用方法。(i)在使用可调光源照射期间监测ESR缺陷信号可以提供相关缺陷的额外光学参数，例如陷阱深度和激发态的位置（本质上是光学吸收实验和ESR的结合）。(ii)其中材料的发光是自旋相关的在电子-电子复合（例如，在供体-受体对复合中）中，ESR信号可以由发光信号携带。（磁共振光学检测，ODMR），ODMR在理解中等能带半导体中缺陷和发光之间的联系方面特别成功，间隙能量（Eg<~3eV），其中合适的实验室光激发源广泛可用。相比之下，几乎没有对诸如氮化硼和氮化铝（Eg~ 6 eV）的宽禁带材料进行类似的工作，然而这些类别的材料在开发紫外光电子器件（激光器、LED等）中具有潜在的未来重要性。这类研究的主要障碍是提供合适的基于实验室的高能光激发源。然而，在这个国家和海外都有适合这些实验的光源;同步加速器光源和更复杂的激光系统（光学和自由电子）可以用于研究。此外，将ODMR和相关的X射线吸收光学检测（ODXAS）结合起来的可能性特别有吸引力，因为组合的测量方法将使样品的光学发射特性与晶格结构和其中包含的缺陷之间直接联系。由于这种方法是完全独特的，目前，世界上还没有能够进行这种科学研究的适当的实验能力。因此，拟议工作的一个核心目标是开发这种能力，并通过应用于一些对开发新的紫外光光电器件（LED，激光器等）特别感兴趣的宽带隙材料来证明其有效性，并了解适用于癌症放射治疗领域辐射监测的材料。这项工作将使英国在开发这种先进的分析方法方面处于领先地位，并且是计划中的先进光源（如4GLS和XFEL）新实验的必要先决条件。

The optical and electronic properties of semiconductors and insulators are strongly dependent on the presence of defects contained within them, and their study has profound influence on the development of new optoelectronic materials. Electron spin resonance (ESR) measurements are particularly valuable in determining the electronic and structural properties of the defects, but coupling of light excitation/detection capabilities within the ESR experiment provides extremely valuable additional information. Two traditional generic methods have been deployed in this respect. (i) Monitoring of the ESR defect signals during illumination with tuneable light sources can provide additional optical parameters of the defects concerned, such as trap depth and the location of excited states (essentially a marriage of optical absorption experiments and ESR). (ii) Where the luminescence of a material is spin dependent (e.g. in donor-acceptor pair recombination), ESR signals can be carried by the luminescence (Optical Detection of Magnetic Resonance, ODMR), and this provides direct and unequivocal attribution of particular defects with specific luminescence emission processes.ODMR has proved particularly successful in understanding the link between defects and luminescence in semiconductors of moderate band-gap energies (Eg<~3eV) where suitable laboratory light excitation sources are widely available. In contrast, virtually no comparable work has been undertaken on wider-gap materials such as Boron Nitride and Aluminium Nitride (Eg~6eV), yet these classes of materials are potentially of great future importance in developing UV optoelectronic devices (lasers, LEDs etc). The main obstacle to such studies is in the provision of suitable high-energy lab-based light excitation sources. However, appropriate light sources for these experiments are available both in this country and overseas; synchrotron light sources and more complex laser systems (both optical and free-electron) can potentially be exploited for the research. Furthermore, the possibilities for combing both ODMR and the associated Optical Detection of X-ray Absorption (ODXAS) is particularly attractive, since the combined measurement method would enable a direct link between the optical emission properties of a sample, and structure of both the lattice, and the defects contained within it. As this approach is completely unique, no suitable experimental capabilities exist worldwide at present that can undertake such science. A core goal of the proposed work is thus to develop such capabilities, and demonstrate the effectiveness by application to a number of wide band-gap materials of particular interest to the development of new UV optoelectronic devices (LEDs, lasers etc), and in the understanding of materials suitable for radiation monitoring deployed in the fields of cancer radiotherapy. The work will establish the UK at the forefront in developing such advanced analytical methods, and is a necessary pre-requisite to new experiments on the planned advanced light sources such as 4GLS and XFEL.