Time resolved optical emission spectroscopy

时间分辨发射光谱

• 批准号: 345284-2007
• 负责人: KlembergSapieha, Jolanta
• 金额: $ 5.56万
• 依托单位: École Polytechnique de Montréal
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments - Category 1 (<$150,000)
• 财政年份: 2006
• 资助国家: 加拿大
• 起止时间: 2006-01-01 至 2007-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=325636
• 关键词: Time; resolved; optical; emission; spectroscopy

Vacuum-based technologies using pulsed plasmas are considered most suitable for obtaining tailored nanostructured materials expected to lead to a significant progress in many areas such as optics and photonics, biosensing and imaging, magnetic, optical memory and nanoelectronics devices, hard protective coatings for avionics, aerospace, medical implants, tools, and chemical-mechanical polishing. High density plasmas formed within each individual pulse allow one to obtain momentarily very high plasma densities capable of initiating new chemical reactions in the gas phase or physical reactions at exposed surfaces, or of controlling the energy and flux of ions and energetic condensing particles at the substrates. In the present grant application, we seek funding for a time resolved optical emission spectrometer with a time resolution of 5 ns over a large wavelength range of 200-950 nm. This instrument, fully compatible with the existing film fabrication systems, will allow us to contribute cutting edge research in  fundamental understanding of the basic plasma processes as well as in the development of the deposition technologies including pulsed magnetron sputtering (PMS), high power impulse magnetron sputtering (HIPIMS), plasma enhanced chemical vapor deposition (PECVD), and pulsed laser ablation (PLA).

使用脉冲等离子体的基于纳米的技术被认为是最适合于获得定制的纳米结构材料，预期在许多领域，如光学和光子学、生物传感和成像、磁性、光学存储器和纳米电子器件、航空电子设备的硬保护涂层、航空航天、医疗植入物、工具和化学机械抛光中导致重大进展。在每个单独的脉冲内形成的高密度等离子体允许获得瞬时非常高的等离子体密度，该等离子体密度能够在气相中引发新的化学反应或在暴露表面处的物理反应，或者能够控制离子和高能凝聚粒子在衬底处的能量和通量。在目前的拨款申请中，我们寻求资助的时间分辨光学发射光谱仪的时间分辨率为5纳秒在200-950纳米的大波长范围内。该仪器与现有的薄膜制造系统完全兼容，将使我们能够在基本等离子体工艺的基础理解以及沉积技术的发展方面做出最前沿的研究，包括脉冲磁控溅射（PMS），高功率脉冲磁控溅射（HIPIMS），等离子体增强化学气相沉积（PECVD）和脉冲激光烧蚀（PLA）。