Time resolved optical emission spectroscopy

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Vacuum-based technologies using pulsed plasmas are considered most suitable for obtaining tailored nanostructured materials expected to lead to a significant progress in many areas such as optics and photonics, biosensing and imaging, magnetic, optical memory and nanoelectronics devices, hard protective coatings for avionics, aerospace, medical implants, tools, and chemical-mechanical polishing. High density plasmas formed within each individual pulse allow one to obtain momentarily very high plasma densities capable of initiating new chemical reactions in the gas phase or physical reactions at exposed surfaces, or of controlling the energy and flux of ions and energetic condensing particles at the substrates. In the present grant application, we seek funding for a time resolved optical emission spectrometer with a time resolution of 5 ns over a large wavelength range of 200-950 nm. This instrument, fully compatible with the existing film fabrication systems, will allow us to contribute cutting edge research in  fundamental understanding of the basic plasma processes as well as in the development of the deposition technologies including pulsed magnetron sputtering (PMS), high power impulse magnetron sputtering (HIPIMS), plasma enhanced chemical vapor deposition (PECVD), and pulsed laser ablation (PLA).