High pressure RHEED for PLD chamber/ Système RHEED à haute pression pour une chambre d'ablation laser

用于 PLD 腔室的高压 RHEED/系统 RHEED à 高级压力浇注腔室 d烧蚀激光

• 批准号: 359217-2008
• 负责人: Fournier, Patrick
• 金额: $ 7.37万
• 依托单位: Université de Sherbrooke
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments - Category 1 (<$150,000)
• 财政年份: 2008
• 资助国家: 加拿大
• 起止时间: 2008-01-01 至 2009-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=403692
• 关键词: pressure; RHEED; PLD; chamber; Syst

This grant application proposes the acquisition and installation of a high pressure Reflection High-Energy Electron Diffraction (RHEED) system onto an existing custom-designed pulsed-laser ablation deposition (PLD) chamber. This in-situ characterisation tool will help monitor the surface of thin films during their growth. The information obtained will allow us to better control the growth processes in order to improve significantly the quality of the epitaxial thin films and even to target specific termination layers of the materials. Thus, it will play a major role in the control of the interface between two successive materials deposited in multilayered electronic devices that could exhibit exotic novel behaviours. All the projects will involve oxide-based thin films. Some of these projects target the origin of high temperature superconductivity and their possible harnessing into simple electronic components when combining them to other oxide materials like colossal magnetoresistance manganites. For example, we will attempt to grow multilayers with artificially-induced superconductivity.

这项拨款申请提出了一个高压反射高能电子衍射（RHEED）系统到现有的定制设计的脉冲激光烧蚀沉积（PLD）室的收购和安装。这种原位表征工具将有助于在薄膜生长过程中监测薄膜表面。所获得的信息将使我们能够更好地控制生长过程，以显着提高外延薄膜的质量，甚至针对特定的终止层的材料。 因此，它将在控制沉积在多层电子器件中的两种连续材料之间的界面方面发挥重要作用，这种多层电子器件可能表现出奇异的新行为。所有的项目都将涉及氧化物薄膜。其中一些项目的目标是高温超导性的起源，以及当将它们与其他氧化物材料（如巨磁阻锰氧化物）结合时，它们可能被利用到简单的电子元件中。例如，我们将尝试用人工诱导的超导性来生长多层膜。