Nanofabrication and nanointegration processes

该提案是关于纳米制造的三个子项目。首先是发展对溅射沉积工艺的综合理解，该工艺广泛应用于微纳米电子、磁存储、光学和其他行业中制造薄膜。该项目将更好地理解和控制薄膜性能和工艺参数之间的关系。因此，可以开发出更高质量和更新的薄膜应用。第二个项目是研究电子束光刻形成纳米级图案的能力。这项工作将导致更好的电子束工艺，以允许更高的分辨率和更高的可重复性光刻结构。最后的项目涉及使用生物分子将微和纳米组件组装成功能纳米系统。抗体和DNA将用于从溶液到共同底物的各种不同亚微米组分的高度特异性和平行组装。特别是，这项工作将集中在定位、定向和将纳米芯片连接到硅片上，然后将它们连接起来。这将为功能性纳米系统的商业实现提供一个架构。这些项目建议与工业界和NRC国家纳米技术研究所（NINT）合作。

This proposal is for three sub-projects related to nanofabrication. The first is to develop an integrated understanding of the sputter deposition process employed extensively to create thin films used in micro- and nanoelectronics, magnetic storage, optics, and other industries. The project will provide a better understanding and control of the relationship between film properties and process parameters. As a result, higher quality and newer applications of films can be developed. The second project is to study the ability of electron beam lithography to form nanoscale patterns. This work will lead to better electron beam processes to allow for higher resolution and greater repeatability of lithographic structures. The final project deals with the use of biomolecules to assemble micro- and nanocomponents into functioning nanosystems. Antibodies and DNA will be used to allow the highly specific and parallel assembly of various different submicron components from solution onto a common substrate. In particular, this work will focus on positioning, orienting and attaching nanochips onto a silicon wafer and then wiring them up. This will provide an architecture for the commercial realization of functioning nanosystems. These projects are proposed to be in collaboration with industry and the NRC National Institute for Nanotechnology (NINT).