Nanofabrication and nanointegration processes

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This proposal is for three sub-projects related to nanofabrication. The first is to develop an integrated understanding of the sputter deposition process employed extensively to create thin films used in micro- and nanoelectronics, magnetic storage, optics, and other industries. The project will provide a better understanding and control of the relationship between film properties and process parameters. As a result, higher quality and newer applications of films can be developed. The second project is to study the ability of electron beam lithography to form nanoscale patterns. This work will lead to better electron beam processes to allow for higher resolution and greater repeatability of lithographic structures. The final project deals with the use of biomolecules to assemble micro- and nanocomponents into functioning nanosystems. Antibodies and DNA will be used to allow the highly specific and parallel assembly of various different submicron components from solution onto a common substrate. In particular, this work will focus on positioning, orienting and attaching nanochips onto a silicon wafer and then wiring them up. This will provide an architecture for the commercial realization of functioning nanosystems. These projects are proposed to be in collaboration with industry and the NRC National Institute for Nanotechnology (NINT).