Hardware and software upgrades of pulsed electron beam physical vapor deposition system

脉冲电子束物理气相沉积系统软硬件升级

• 批准号: 440202-2013
• 负责人: Yue, Stephen
• 金额: $ 10.85万
• 依托单位: McGill University
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments - Category 1 (<$150,000)
• 财政年份: 2012
• 资助国家: 加拿大
• 起止时间: 2012-01-01 至 2013-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=509734
• 关键词: Hardware; software; upgrades; pulsed; electron

Electron-beam Physical vapor deposition(EB-PVD) is an advanced engineering coating technique for aerospace and electronic applications. The technique involves material evaporation using a high powered electron beam. The resulting vapor is then condensed onto the component with a precisely defined structure, thickness and chemistry. The advantage of EB-PVD is the ability to process elements and compounds which are not practical using other established techniques, especially if thick coatings are desired.

电子束物理气相沉积（EB-PVD）是一种用于航空航天和电子应用的先进工程涂层技术。该技术涉及使用高功率电子束进行材料蒸发。然后，产生的蒸汽被冷凝到具有精确定义的结构、厚度和化学性质的部件上。 EB-PVD 的优点是能够处理使用其他现有技术无法实现的元素和化合物，特别是在需要厚涂层的情况下。