Study of the formation of thin films materials and their properties

薄膜材料的形成及其性能研究

• 批准号: 222929-2007
• 负责人: Morin, Sylvie
• 金额: $ 3.28万
• 依托单位: York University
• 依托单位国家: 加拿大
• 项目类别: Discovery Grants Program - Individual
• 财政年份: 2013
• 资助国家: 加拿大
• 起止时间: 2013-01-01 至 2014-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=523877
• 关键词: Study; formation; thin; films; materials

There is a strong drive in the scientific community to control matter on the nanometer length scale that is at the level of atoms, molecules, and supramolecular structures to create useful materials, devices and systems for application in nanotechnology. Chemists have contributed greatly to this area by proposing new ways to assemble, pattern and incorporate molecules and materials that can have potential impact on the cost, speed and quality of the next generation of electronic devices such as chips, hard drive memory and energy efficient monitors. Our research program deals in one way or another with low dimensionality systems and the importance of changes in material properties due to the modification of their surface. The first objective of this research program is to produce and characterize functional films on silicon surfaces. Wet chemistry on silicon surfaces was shown to be particular well suited for future integration in nanotechnology's "bottom-up" fabrication strategy. The approach taken in our work shows promises in creating good quality films that can then be used for property characterizations and device fabrication. This is paramount since the first concern of colleagues interested in applications for these materials is related to the presence of oxide at the silicon surface. The presence of silicon oxide impurities will have a great impact on the future device performance. Ultimately we wish to understand the formation of these materials and to relate their structures and morphology to their electrochemical/electronic properties.

在科学界有一个强大的驱动力来控制在纳米长度尺度上的物质，即在原子、分子和超分子结构的水平上，以创造用于纳米技术的有用材料、设备和系统。化学家们通过提出新的方法来组装、图案化和整合分子和材料，对下一代电子设备（如芯片、硬盘存储器和节能显示器）的成本、速度和质量产生潜在影响，从而为这一领域做出了巨大贡献。我们的研究计划以一种或另一种方式处理低维系统以及由于其表面改性而导致的材料性质变化的重要性。该研究计划的第一个目标是在硅表面制备和表征功能薄膜。硅表面上的湿化学被证明是特别适合于未来集成在纳米技术的“自下而上”的制造策略。 在我们的工作中所采取的方法显示出在创建高质量的薄膜，然后可以用于性能表征和设备制造的承诺。这是至关重要的，因为对这些材料的应用感兴趣的同事的第一个关注点与硅表面氧化物的存在有关。氧化硅杂质的存在将对未来的器件性能产生很大的影响。最终，我们希望了解这些材料的形成，并将它们的结构和形态与它们的电化学/电子特性联系起来。