Ultra-high resolution depth profiling for nanomaterials and energy applications

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The innovative design of functional materials and their interfaces is essential for improving existing and emerging technologies. For example, novel nanomaterials are now being developed to eventually replace conventional complementary metal-oxide-semiconductor (CMOS) technology in transistors, flash memory, and other devices. The pursuit of improved materials and devices strongly depends on existing and new tools for probing their structure, composition and properties at the atomic scale. Although characterization and metrology methods have made great advances, many areas will continue to be challenged by feature size reduction. In our group we focus on the atomic-scale behavior of complex materials and their interfaces. We will employ novel methods of growing nanomaterials (ion implantation, atomic layer deposition, molecular beam epitaxy) and surface characterization with sub-nanometer depth resolution (such as medium energy ion scattering), and the atomic lateral resolution (scanning probe microscopy).