Towards recovery of used water generated by a semiconductor surface cleaning process

点击翻译按钮获取中文摘要

The semiconductor industry has experienced rapid growth due to an unprecedented demand of microelectronics in virtually all aspects of human life including communications, transport, and consumer products. This expansion has brought a great environmental concern due to generation of large quantities of used water containing organic and inorganic compounds as by-products generated during the various steps of fabrication of microelectronics and microelectromechanical systems. Therefore, one of the greatest challenges of Teledyne DALSA Semiconductor based in Bromont, QC is the amount of used water produced. A sustainable approach to meet that challenge is to treat the used water and reuse it in other manufacturing processes. This would also allow the recovery of chemicals. Therefore, the objective of the project described in this is proposal is to characterize used water generated by the semiconductor surface cleaning process employed at Teledyne DALSA Semiconductor's installations at the MiQro Innovation Collaborative Center (C2MI) in Bromont, QC and then evaluate diverse water treatment technologies to implement the best strategy for water recovery. Thus, our study will provide the required information to design a pilot plant system in a future collaborative research project.