Ion Beam Milling System

离子束铣削系统

• 批准号: RTI-2016-00069
• 负责人: Mansour, Raafat
• 金额: $ 10.55万
• 依托单位: University of Waterloo
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments
• 财政年份: 2015
• 资助国家: 加拿大
• 起止时间: 2015-01-01 至 2016-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=591335
• 关键词: Ion; Beam; Milling; System

The purpose of this Research Tool and Instruments (RTI) grant proposal is to purchase an Ion Milling System for applications in the field of Micro-Electro-Mechanical Systems (MEMS), millimeter-wave, and opto-electronics. The Ion Milling System is a key processing tool in any micro-fabrication facility. This system is highly beneficial for selectively removing thin film materials that cannot be etched using conventional plasma etch techniques such as Pt, Pd, Au, etc. The tool will be fitted with an electrical feedthrough to interrogate the device to be etched between ion exposure steps. The system will be instrumental in investigating the novel concept of integrating our chip-scale MEMS-based atomic force microscopes (AFM) with the requested tool to provide in-situ metrology and end point detection with unprecedented accuracy and resolution. Thus, the tool will be used not only to meet our etching needs but also to investigate the possibilities of enhancing the performance of ion milling techniques through the use of in-situ AFM.

这项研究工具和仪器(RTI)赠款提案的目的是购买离子研磨系统，用于微电子机械系统(MEMS)、毫米波和光电子领域的应用。离子研磨系统是任何微加工设施中的关键加工工具。该系统非常有利于选择性地去除无法使用传统等离子蚀刻技术(如铂、钯、金等)蚀刻的薄膜材料。该工具将配备电气馈线，以在离子曝光步骤之间询问要蚀刻的设备。该系统将有助于研究将我们的芯片级基于MEMS的原子力显微镜(AFM)与所要求的工具相结合的新概念，以提供具有前所未有的精度和分辨率的现场测量和终点检测。因此，该工具将不仅用于满足我们的刻蚀需求，而且还将用于研究通过使用原位AFM来提高离子研磨技术性能的可能性。