Fabrication of 2D material devices using large-area manufacturable methods
Fabrication of 2D material devices using large-area manufacturable methods
批准号:
RGPIN-2017-05810
负责人:
Adachi, Michael
金额:
$1.75万
依托单位:
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2018
资助国家:
加拿大
项目状态:
已结题
起止时间:
2018-01-01 至 2019-12-31
中文摘要
拟议的研究计划涉及使用可制造方法制造2D材料(石墨烯类材料)设备。 2D材料是结晶单层材料,其中最著名的是石墨烯。最近,其他2D材料,如单层Si(或硅烯),Ge(或germanene),P(或磷烯)和MoS 2显示出非凡的特性:高测量载流子迁移率(>200 cm 2/Vs),理论载流子迁移率比它们的本体对应物大数倍,由施加的垂直电场控制的可调带隙,高表面积-体积比,用于选择性气体检测的电阻的各向异性变化、柔性以及顺磁性和自旋电子学性质。 然而,文献中目前报道的装置将溶液中的2D材料从单晶衬底机械地转移到形成电接触的非导电衬底,这是不可重复且不可制造的过程。因此,需要创新来开发制造友好的方法来制备2D材料器件。 ** 在未来5年内,我的团队将使用可重复的大面积技术生长2D材料,这些技术与Si制造工艺兼容,以实现大规模生产。同时,我们将使用现有技术(剥离和化学气相沉积)制备2D材料器件,用于开发可调红外探测器,气体传感器,生物传感器,下一代集成电路和透明抗冲击/抗冲击性。2D材料的光学,电子,结构,机械,磁性,热特性将被表征,新发现的特性将用于开发新的应用。该研究计划的长期目标是将我们实验室开发的2D材料设备商业化。我的团队将操作和维护现有的簇沉积工具来制造2D材料设备。 该系统配备有两个溅射沉积室和两个等离子体增强化学气相沉积(PECVD)室。 一个PECVD室也将升级,以能够从气相生长2D材料。集群工具系统的主要优势在于,在一个腔室中生长的2D材料可以覆盖在其他腔室中沉积的高k电介质和金属层上,这在加拿大是一种独特的能力。在腔室之间转移样品使我们能够避免工艺之间的杂质污染和不希望的氧化物形成,这是制造高性能器件的一个重要特征。 应用特定的设备将在合作者的实验室设施中进行测试。 拟议的研究计划将导致新发现的2D材料的材料特性,并使涉及工业合作的设备原型制造取得突破,这将对加拿大高科技部门产生直接影响。
英文摘要
The proposed research program involves the fabrication of 2D materials (graphene-like materials) devices using manufacturable methods. 2D materials are crystalline monolayer materials, the most famous of which is graphene. Recently, other 2D materials such as monolayer Si (or silicene), Ge (or germanene), P (or phosphorene), and MoS2 have shown extraordinary properties: high measured carrier mobility (>200 cm2/Vs), theoretical carrier mobility multiple times larger than their bulk counterpart, tuneable bandgap controlled by applied vertical electric field, high surface-volume ratio, anisotropic changes in resistance for selective gas detection, flexibility, and paramagnetic and spintronic properties. However, devices currently reported in literature mechanically transfer 2D materials in solution from a single crystal substrate, to a non-conducting substrate where electrical contacts are made, a process which is non-repeatable and not manufacturable. Therefore, innovation is required to develop manufacturing-friendly methods to prepare 2D material devices. ******In the next 5 years, my team will grow 2D materials using repeatable, large-area techniques which are compatible with Si manufacturing processes to enable mass-production. In parallel, we will prepare 2D material devices using established techniques (exfoliation and chemical vapor deposition) for developing tuneable infrared detectors, gas sensors, biosensors, next-generation integrated circuits, and transparent impact/shock resistance. The optical, electronic, structural, mechanical, magnetic, thermal properties of 2D materials will be characterized and newly discovered properties will be used to develop new applications. The long-term objective of this research program is to commercialize 2D material devices developed in our lab.******My group will operate and maintain an existing cluster deposition tool to fabricate 2D material devices. This system is equipped with two sputtering deposition chambers and two plasma-enhanced chemical vapor deposition (PECVD) chambers. One PECVD chamber will also be upgraded to be capable of 2D material growth from vapor phase. The key advantage of a cluster tool system is that 2D materials grown in one chamber can be covered with a high-k dielectric and metal layer deposited in other chambers, which would be a unique capability in Canada. Transferring samples between chambers allows us to avoid impurity contamination and undesirable oxide formation between processes, an important feature for making high-performance devices. Application-specific devices will be tested in the lab facilities of collaborators. The proposed research program will lead to newly discovered material properties of 2D materials, and enable breakthroughs in device prototype fabrication involving industrial collaborations, which will have a direct impact on the Canadian high tech sector.
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Fabrication of 2D material devices using large-area manufacturable methods
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批准号:RGPIN-2017-05810
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项目类别:Discovery Grants Program - Individual
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资助金额:$1.75万
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财政年份:2022
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负责人:Adachi, Michael
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批准号:522672-2017
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资助金额:$8.74万
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负责人:Adachi, Michael
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依托单位:
Fabrication of 2D material devices using large-area manufacturable methods
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批准号:RGPIN-2017-05810
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项目类别:Discovery Grants Program - Individual
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资助金额:$1.75万
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Fabrication of 2D material devices using large-area manufacturable methods
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批准号:522672-2017
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项目类别:Collaborative Research and Development Grants
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资助金额:$8.74万
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财政年份:2019
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负责人:Adachi, Michael
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依托单位:
Fabrication of 2D material devices using large-area manufacturable methods
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批准号:RGPIN-2017-05810
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.75万
-
财政年份:2019
-
负责人:Adachi, Michael
-
依托单位:
Fabrication of high flexibility high conversion efficiency heterojunction Si solar cells
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批准号:522672-2017
-
项目类别:Collaborative Research and Development Grants
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资助金额:$8.74万
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财政年份:2018
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负责人:Adachi, Michael
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依托单位:
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批准号:535816-2018
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依托单位:
Vancouver IEEE electron device society mini-colloquium
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项目类别:Connect Grants Level 2
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资助金额:$0.12万
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财政年份:2017
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负责人:Adachi, Michael
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依托单位:
Fabrication of 2D material devices using large-area manufacturable methods
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批准号:RGPIN-2017-05810
-
项目类别:Discovery Grants Program - Individual
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资助金额:$1.75万
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财政年份:2017
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负责人:Adachi, Michael
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依托单位:
Cluster tool-integrated high-temperature evaporation and chemical vapor deposition chamber
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批准号:RTI-2017-00187
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项目类别:Research Tools and Instruments
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财政年份:2016
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负责人:Adachi, Michael
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依托单位:
Cost-effective, flexible thin film silicon solar cells
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批准号:331978-2007
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项目类别:Postgraduate Scholarships - Doctoral
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资助金额:$1.53万
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财政年份:2009
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负责人:Adachi, Michael
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依托单位:
Cost-effective, flexible thin film silicon solar cells
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批准号:331978-2007
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项目类别:Postgraduate Scholarships - Doctoral
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资助金额:$1.53万
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财政年份:2008
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负责人:Adachi, Michael
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依托单位:
Cost-effective, flexible thin film silicon solar cells
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批准号:331978-2007
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依托单位:
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资助金额:$1.26万
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财政年份:2006
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负责人:Adachi, Michael
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依托单位:
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