Fabrication of 2D material devices using large-area manufacturable methods

拟议的研究计划包括使用可制造的方法制造2D材料(类石墨烯材料)器件。2D材料是晶态单层材料，其中最著名的是石墨烯。最近，其他2D材料，如单层Si(或硅烯)、Ge(或Ge)、P(或磷烯)和MoS2已显示出非凡的性能：高的测量载流子迁移率(&gt；200 cm2/vs)，理论载流子迁移率是其体相对应的数倍，可由外加垂直电场控制的带隙可调，高比表面积比，选择性气体检测的电阻的各向异性变化，灵活性，以及顺磁和自旋电子学的特性。然而，目前文献中报道的设备将溶液中的2D材料从单晶衬底机械地转移到形成电接触的非导电衬底上，这一过程是不可重复的，也是不可制造的。因此，需要创新来开发有利于制造的方法来制备2D材料器件。 在接下来的5年里，我的团队将使用与硅制造工艺兼容的可重复的大面积技术来生长2D材料，以实现大规模生产。同时，我们将使用现有的技术(剥离和化学气相沉积)来制备2D材料设备，以开发可调红外探测器、气体传感器、生物传感器、下一代集成电路以及透明的抗冲击/冲击性能。将对2D材料的光学、电子、结构、机械、磁学和热学性质进行表征，并将利用新发现的性质开发新的应用。这项研究计划的长期目标是将我们实验室开发的2D材料设备商业化。 我的团队将操作和维护现有的团簇沉积工具，以制造2D材料设备。该系统配备了两个溅射沉积室和两个等离子体增强化学气相沉积(PECVD)室。一个PECVD室也将升级为能够从气相中生长2D材料。集束式工具系统的主要优势是，在一个腔室中生长的2D材料可以覆盖在其他腔室中沉积的高k电介质和金属层，这在加拿大将是一种独特的能力。通过在不同的腔室之间转移样品，我们可以避免在工艺之间产生杂质污染和不必要的氧化物形成，这是制造高性能器件的一个重要特征。特定于应用的设备将在协作者的实验室设施中进行测试。拟议的研究计划将导致新发现的2D材料的材料特性，并使涉及行业合作的设备原型制造方面取得突破，这将对加拿大高科技行业产生直接影响。

The proposed research program involves the fabrication of 2D materials (graphene-like materials) devices using manufacturable methods. 2D materials are crystalline monolayer materials, the most famous of which is graphene. Recently, other 2D materials such as monolayer Si (or silicene), Ge (or germanene), P (or phosphorene), and MoS2 have shown extraordinary properties: high measured carrier mobility (>200 cm2/Vs), theoretical carrier mobility multiple times larger than their bulk counterpart, tuneable bandgap controlled by applied vertical electric field, high surface-volume ratio, anisotropic changes in resistance for selective gas detection, flexibility, and paramagnetic and spintronic properties. However, devices currently reported in literature mechanically transfer 2D materials in solution from a single crystal substrate, to a non-conducting substrate where electrical contacts are made, a process which is non-repeatable and not manufacturable. Therefore, innovation is required to develop manufacturing-friendly methods to prepare 2D material devices. In the next 5 years, my team will grow 2D materials using repeatable, large-area techniques which are compatible with Si manufacturing processes to enable mass-production. In parallel, we will prepare 2D material devices using established techniques (exfoliation and chemical vapor deposition) for developing tuneable infrared detectors, gas sensors, biosensors, next-generation integrated circuits, and transparent impact/shock resistance. The optical, electronic, structural, mechanical, magnetic, thermal properties of 2D materials will be characterized and newly discovered properties will be used to develop new applications. The long-term objective of this research program is to commercialize 2D material devices developed in our lab. My group will operate and maintain an existing cluster deposition tool to fabricate 2D material devices. This system is equipped with two sputtering deposition chambers and two plasma-enhanced chemical vapor deposition (PECVD) chambers. One PECVD chamber will also be upgraded to be capable of 2D material growth from vapor phase. The key advantage of a cluster tool system is that 2D materials grown in one chamber can be covered with a high-k dielectric and metal layer deposited in other chambers, which would be a unique capability in Canada. Transferring samples between chambers allows us to avoid impurity contamination and undesirable oxide formation between processes, an important feature for making high-performance devices. Application-specific devices will be tested in the lab facilities of collaborators. The proposed research program will lead to newly discovered material properties of 2D materials, and enable breakthroughs in device prototype fabrication involving industrial collaborations, which will have a direct impact on the Canadian high tech sector.