旋转式近场光刻是一种新型的光刻方法，其特点在于利用表面等离子体透镜在近场范围内的优异聚焦特性，结合工件高速旋转时对等离子体飞行头产生的气浮作用形成稳定的近场条件，实现纳米图案的高效、高分辨光刻。本课题组通过前期研究已突破纳米图案的旋转式近场光刻制造的核心技术瓶颈，建立纳米图案的旋转式近场光刻原型制造系统和演示试验平台。但系统的加工线宽稳定性、深宽比以及精确定位能力还有待提高。本项目将结合纳米间隙下稀薄气体润滑理论和表面力作用规律优化气浮承载面结构提高系统的加工稳定性；利用表面等离子体透镜诱导刻蚀的方法增强结构的深宽比；利用双级纳米级控制方法实现等离子体飞行头的精确定位控制；以此实现具有一定复杂程度、特征线宽30纳米以下的图案的加工制造，并对近场光刻工艺进行多元化探索。

Rotational near-field lithography (RNFL) is a novel lithography technique. In this technique, the excellent light beam focusing properties of plasmonic lens (PL) at near field are utilized, and the use of the air bearing effect of a flying slider under the high speed rotation of the substrate allows precise control of the gap between the PL and substrate to ensure the rotating substrate to be located at the near field of the PL. Consequently, RNFL can be used to fabricate nano-patterns at high throughput and high resolution. In the previous project, the researchers have broken through the bottle-neck of RNFL nano-patterning, and fabricated a prototype or a demo RNFL system. However, the system stability of patterning, the ratio of depth to width and the precision positioning capabilities still should be improved. In this project, the system stability will be improved with optimizing the structure of air bearing surface by considering the rarefied gas lubrication theory and surface forces in nano-scale. The high ratio of depth to width would be achieved with the aid of the locally enhanced plasma etching under the flying plasmonic lens. The precision positioning capabilities will be realized with double control nano-stage. The aim of the project is at successful fabrication of intricate patterns with a feature size less than 30 nm, and exploration the diversified applications of RNFL.