宽温域非平衡磁控溅射二硫化钨薄膜生长机理、结构演变及其摩擦学性能的研究

本课题立足于薄膜材料领域的研究前沿和我国空间技术发展的技术需求，综合了低温和非平衡磁控溅射技术，以二硫化钨固体润滑材料作为研究对象，开展宽温域（77K-900K）沉积薄膜材料的生长机理、结构演变规律和摩擦学性能的研究，系统研究沉积粒子能量和应力/应变对薄膜生长的影响，阐明宽温域沉积二硫化钨薄膜的生长机理，揭示其结构和摩擦学性能随工艺参数的变化规律，进而构建新型的薄膜生长结构区域模型。开展此研究工作，不仅可进一步地深化薄膜生长基础知识，研究结果还可为我国新型空间长寿命、高可靠固体润滑薄膜的结构设计和性能优化提供理论依据和技术指导。

This research is proposed based on the frontier in the film material field and development needs of China's space technology. The WS2 film, a typical solid lubricating material for space application, will be deposited by unbalanced magnetron sputter bonding with low temperature technology at a wide-temperature range of 77-900 K. The growth, structure and tribological performances of the films will be fully investigated by overall considering the effects of adatom’s mobility and stress/strain on the film growth. The film growth mechanism will be clarified, the variation rule of the film structure and tribological performances with the process parameters be revealed, and then a new structure zone model be built. To Implement this research can not only develop the film growth theory and model, but also provide the theoretical basis and guidance for the structure design and performance optimization of space solid lubricating films with long service life and high reliability.