In situ observation of nanotwins formation through twin terrace growth in pulse electrodeposited Cu films.
In situ observation of nanotwins formation through twin terrace growth in pulse electrodeposited Cu films.
复制标题
原位观察脉冲电沉积铜膜中孪晶平台生长形成的纳米孪晶
DOI：
10.1038/s41598-017-10096-5
复制
发表时间：
2017-09-29
影响因子：
4.6
通讯作者：
Luo L
中科院分区：
文献类型：
--
作者：
Cheng G;Li H;Xu G;Gai W;Luo L
纳米孪生铜结合了优异的力学和电学性能，在集成电路工业中作为互连材料具有广阔的应用前景。然而，脉冲电沉积铜膜中孪晶的形成和生长行为尚不完全清楚。本文通过对电镀工艺参数的验证，制备了一系列电镀铜薄膜，并用扫描电子显微镜和透射电子显微镜对薄膜的微观结构进行了分析。表面形态显示了堆叠的双胞胎梯田和层状结构的有力证据，表明纳米双胞胎逐层生长。结合扫描电子显微镜的原位表征和分子动力学(MD)模拟，证明梯形结构起源于晶界的三重结，并沿(111)晶面横向延伸生长。在此基础上，推导出了不同于形变孪晶和退火孪晶的孪晶阶梯生长模型。这种生长模式将有助于在工业上获得高质量的NT-Cu。
Nanotwinned copper (nt-Cu) shows a broad application prospects as interconnection materials in integrated circuit industry, since it combines the excellent mechanical and electrical properties. However, the formation and growth behavior of twin lamellae in pulse electrodeposited copper films are not fully understood. In this work, a series of electroplated copper films are prepared by verifying the electroplating parameters and the microstructures are analyzed using scanning electron microscope (SEM) and transmission electron microscope (TEM). The surface morphology indicates strong evidence of stacked twin terraces and layers, suggesting that nanotwins grow up layer by layer. Combined with in situ characterization by SEM and molecular dynamics (MD) simulation, it is proved that the terraces originate from the triple junction of grain boundaries and grow up by extending along the lateral (111) crystal plane. A twin terrace-growing model for nt-Cu is then deduced, which distinguishes from deformation twins or annealed twins. This growth model would be prospective to help obtain high quality of nt-Cu in industry.
登录
查看更多内容
影响因子：
3.9
作者：
Kongstein, OE;Bertocci, U;Stafford, GR
通讯作者：
Stafford, GR
影响因子：
9.4
作者：
Lu, Lei;Zhu, Ting;Suresh, Subra
通讯作者：
Suresh, Subra
影响因子：
1.6
作者：
Tu, K. N.;Hsiao, Hsiang-Yao;Chen, Chih
通讯作者：
Chen, Chih
影响因子：
56.9
作者：
Chen, Kuan-Chia;Wu, Wen-Wei;Tu, K. N.
通讯作者：
Tu, K. N.
影响因子：
6.3
作者：
Gronbech-Jensen, Niels;Hayre, Natha Robert;Farago, Oded
通讯作者：
Farago, Oded